0

Full Content is available to subscribers

Subscribe/Learn More  >
Proceedings Article

Development of a laboratory extreme-ultraviolet lithography tool

[+] Author Affiliations
Daniel A. Tichenor, Glenn D. Kubiak, Michael E. Malinowski, Richard H. Stulen, Steven J. Haney, Kurt W. Berger, Rodney P. Nissen, G. A. Wilkerson, Phillip H. Paul, S. R. Birtola, P. S. Jin, Richard W. Arling, Avijit K. Ray-Chaudhuri, William C. Sweatt, Weng W. Chow

Sandia National Labs. (USA)

John E. Bjorkholm, Richard R. Freeman, Marc D. Himel, Alastair A. MacDowell, Donald M. Tennant, Linus A. Fetter, Obert R. Wood II, Warren K. Waskiewicz, Donald L. White, David L. Windt

AT&T Bell Labs. (USA)

Tanya E. Jewell

Optical Engineering Consultant (USA)

Proc. SPIE 2194, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing IV, 95 (May 13, 1994); doi:10.1117/12.175834
Text Size: A A A
From Conference Volume 2194

  • Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing IV
  • David O. Patterson
  • San Jose, CA | February 27, 1994

abstract

The development of a laboratory EUV lithography tool based on a laser plasma source, a 10x Schwarzschild camera, and a magnetically levitated wafer stage is presented. Interferometric measurements of the camera aberrations are incorporated into physical-optics simulations to estimate the EUV imaging performance of the camera. Experimental results demonstrate the successful matching of five multilayer reflecting surfaces, coated to specification for a wide range of figure and incidence angle requirements. High-resolution, 10x-reduction images of a reflection mask are shown.

© (1994) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

Daniel A. Tichenor ; Glenn D. Kubiak ; Michael E. Malinowski ; Richard H. Stulen ; Steven J. Haney, et al.
"Development of a laboratory extreme-ultraviolet lithography tool", Proc. SPIE 2194, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing IV, 95 (May 13, 1994); doi:10.1117/12.175834; http://dx.doi.org/10.1117/12.175834


Access This Article
Sign In to Access Full Content
Please Wait... Processing your request... Please Wait.
Sign in or Create a personal account to Buy this article ($15 for members, $18 for non-members).
 

Figures

Tables

NOTE:
Citing articles are presented as examples only. In non-demo SCM6 implementation, integration with CrossRef’s "Cited By" API will populate this tab (http://www.crossref.org/citedby.html).

Some tools below are only available to our subscribers or users with an online account.

Related Content

Customize your page view by dragging & repositioning the boxes below.

Related Book Chapters

Topic Collections

Advertisement


Buy this article ($18 for members, $25 for non-members).
Sign In