Instrument for calibrating atomic force microscope standards

Jason Schneir; Thomas H. McWaid; Theodore V. Vorburger

doi:10.1117/12.174164

1 May 1994 Instrument for calibrating atomic force microscope standards

Jason Schneir, Thomas H. McWaid, Theodore V. Vorburger

Proceedings Volume 2196, Integrated Circuit Metrology, Inspection, and Process Control VIII; (1994) https://doi.org/10.1117/12.174164
Event: SPIE's 1994 Symposium on Microlithography, 1994, San Jose, CA, United States

Abstract

To facilitate the use of AFMs for manufacturing we have initiated a project to develop and calibrate artifacts which can in turn be used to calibrate a commercial AFM so that subsequent AFM measurement are accurate and traceable back to the wavelength of light. We plan to calibrate our artifacts using a specially designed AFM system which we call the Calibrated AFM (C-AFM). The C-AFM has been constructed as much as possible out of commercially available components. We use a flexure stage driven by piezoelectric transducers for scanning; a heterodyne interferometer to measure the X-Y position of the sample; a capacitance sensor to measure the Z position of the sample; and a commercially available AFM control system. The control system has two feedback loops which read from the X and Y interferometers, respectively, and adjust the piezoelectric voltages to keep the X-Y scan position accurate. The critical electromechanical and metrology issues involved in the construction and operation of such a system are discussed in detail.

Citation Download Citation

Jason Schneir, Thomas H. McWaid, and Theodore V. Vorburger "Instrument for calibrating atomic force microscope standards", Proc. SPIE 2196, Integrated Circuit Metrology, Inspection, and Process Control VIII, (1 May 1994); https://doi.org/10.1117/12.174164

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