Fabrication and characterization of microwave-plasma-assisted chemical vapor deposited dielectric coatings

Roger M. Wood; Adrian C. Greenham; Bruce A. Nichols; Noorallah Nourshargh; Keith L. Lewis

doi:10.1117/12.27523

1 June 1991 Fabrication and characterization of microwave-plasma-assisted chemical-vapor-deposited dielectric coatings

Roger M. Wood, Adrian C. Greenham, Bruce A. Nichols, Noorallah Nourshargh, Keith L. Lewis

Proceedings Volume 1441, Laser-Induced Damage in Optical Materials: 1990; (1991) https://doi.org/10.1117/12.27523
Event: Laser-Induced Damage in Optical Materials: 1990, 1990, Boulder, CO, United States

Abstract

A microwave plasma assisted chemical vapor deposition (MPACVD) process has been used to deposit modulated refractive index profile dielectric films to meet specific reflectance/transmittance coating characteristics. The MPACVD process has been proven to allow the deposition of dielectric thin films of excellent optical quality which have lower scatter and less strain than most conventional coatings. An important feature of the process is that both the deposition rate and the composition of the film can be adjusted under computer control during the deposition process. This degree of control allows the deposition of both graded and event more complicated refractive index profiles. The technique therefore allows the successful realization of highly sophisticated coating designs (e.g., Fourier). The process has been used to fabricate a range of dielectric designs, including narrow band high reflectivity coatings with minimal sidebands, using silicon oxynitride on fused silica substrates. This paper discusses aspects of the MPACVD process, including deposition rate, control, uniformity and deposition quality, the Fourier design program and the characteristics of a range of coating trials. The measurements made have included optical, laser and limited environmental testing.

Citation Download Citation

Roger M. Wood, Adrian C. Greenham, Bruce A. Nichols, Noorallah Nourshargh, and Keith L. Lewis "Fabrication and characterization of microwave-plasma-assisted chemical-vapor-deposited dielectric coatings", Proc. SPIE 1441, Laser-Induced Damage in Optical Materials: 1990, (1 June 1991); https://doi.org/10.1117/12.27523

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available