Double-pulsed-carrier speckle-shearing pattern interferometry for transient deformation analysis

J. L. Fernandez; Antonio Fernandez; Angel F. Doval; Abundio Davila; Jesus Blanco-Garcia; Carlos Perez-Lopez

doi:10.1117/12.312955

30 June 1998 Double-pulsed-carrier speckle-shearing pattern interferometry for transient deformation analysis

J. L. Fernandez, Antonio Fernandez, Angel F. Doval, Abundio Davila, Jesus Blanco-Garcia, Carlos Perez-Lopez

Proceedings Volume 3478, Laser Interferometry IX: Techniques and Analysis; (1998) https://doi.org/10.1117/12.312955
Event: SPIE's International Symposium on Optical Science, Engineering, and Instrumentation, 1998, San Diego, CA, United States

Abstract

We report on a novel technique for the evaluation of transient phase in double-pulsed electronic speckle-shearing pattern interferometry. Our technique requires the acquisition of just two speckle-shear interferograms which are correlated by subtraction to obtain a fringe pattern. A spatial carrier is generated by means of an original optical setup based on the separation and later recombination of the two beams produced by a Nd:YAG twin pulsed laser. One introduces an optical path difference in the curvature radii of the illumination beams by mismatching the distances from two diverging lenses to a beam combiner. This procedure gives rise to a linear phase term in the second speckle- shear interferogram that plays the role of a spatial carrier and allows the use of spatial phase measurement methods to analyze the fringe pattern. We present the theoretical aspects of the technique as well as its experimental implementation.

Citation Download Citation

J. L. Fernandez, Antonio Fernandez, Angel F. Doval, Abundio Davila, Jesus Blanco-Garcia, and Carlos Perez-Lopez "Double-pulsed-carrier speckle-shearing pattern interferometry for transient deformation analysis", Proc. SPIE 3478, Laser Interferometry IX: Techniques and Analysis, (30 June 1998); https://doi.org/10.1117/12.312955

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