Sensitivity of AsxSe100-x thin films for electron-beam irradiation

Nina Nordman; Olli Nordman; Nasser Peyghambarian

doi:10.1117/12.321982

21 September 1998 Sensitivity of As_xSe_100-x thin films for electron-beam irradiation

Nina Nordman, Olli Nordman, Nasser Peyghambarian

Proceedings Volume 3482, International Optical Design Conference 1998; (1998) https://doi.org/10.1117/12.321982
Event: International Optical Design Conference, 1998, Kona, HI, United States

Abstract

Recently we have reported on the influence of the electron beam on As₂S₃ thin films. However, the sensitivity of the As_xSe_100-x thin films with different compositions has not been investigated. Here we report on our measurement of the index change of As_xSe_100-x thin films for the construction of the graded index optical components.

Citation Download Citation

Nina Nordman, Olli Nordman, and Nasser Peyghambarian "Sensitivity of As_xSe_100-x thin films for electron-beam irradiation", Proc. SPIE 3482, International Optical Design Conference 1998, (21 September 1998); https://doi.org/10.1117/12.321982

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