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Proceedings Article

Effects of higher order aberrations on the process window

[+] Author Affiliations
Joseph E. Gortych

IBM/General Technology Div. (USA)

David M. Williamson

SVGL Lithography Systems, Inc. (United Kingdom)

Proc. SPIE 1463, Optical/Laser Microlithography IV, 368 (July 1, 1991); doi:10.1117/12.44796
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From Conference Volume 1463

  • Optical/Laser Microlithography IV
  • Victor Pol
  • San Jose, United States | March 06, 1991

abstract

High-quality imaging is essential for having the largest available process window for the various lithographic mask features, particularly those at the resolution limit of the lens. While lithographic lenses are designed to be 'diffraction limited,' shortcomings in the manufacturing process can introduce aberrations which affect imaging. The effects of such aberrations are explored via computer simulation, using exposure-defocus (E-D) diagrams and plots of linewidth versus focus for isolated and grouped lines. Data from a variety of lithographic lenses and the criteria for measuring lens performance are discussed.

© (1991) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

Joseph E. Gortych and David M. Williamson
"Effects of higher order aberrations on the process window", Proc. SPIE 1463, Optical/Laser Microlithography IV, 368 (July 1, 1991); doi:10.1117/12.44796; http://dx.doi.org/10.1117/12.44796


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