Mechanistic studies on the poly(4-tert-butoxycarbonyloxystyrene)/triphenylsulfonium salt photoinitiation process

Nigel P. Hacker; Kevin M. Welsh

doi:10.1117/12.46387

1 June 1991 Mechanistic studies on the poly(4-tert-butoxycarbonyloxystyrene)/triphenylsulfonium salt photoinitiation process

Nigel P. Hacker, Kevin M. Welsh

Author Affiliations +

Proceedings Volume 1466, Advances in Resist Technology and Processing VIII; (1991) https://doi.org/10.1117/12.46387
Event: Microlithography, 1991, San Jose, CA, United States

Abstract

Studies on the poly(4-tert-butoxycarbonyloxystyrene)/triphenylsulfonium salt (TBOC resist) photoinitiation process show strong evidence for a dual photoinitiation process. Photolysis studies on the relative quantum yields and also the ratios for in-cage versus cage-escape sulfide show that the TBOC polymer behaves differently from other polymers and likely sensitizes the decomposition of some of the triphenylsulfonium salt. Also the TBOC resist shows photoactivity at 300 nm, where the polymer absorbs but the triphenylsulfonium salt has only very weak absorbance, which suggests that the sensitization process is initiated by the polymer. However the fact that substantial amounts of in-cage products are also formed for photolysis of the TBOC resist, implicates a direct photodecomposition of the triphenylsulfonium salt. Fluorescence quenching studies on TBOC resist films show that the sensitization proceeds by electron transfer from the singlet excited state of the TBOC polymer and that a mainly static quenching mechanism is involved. The photoinitiation of the TBOC cleavage reaction proceeds by a dual initiation pathway which involves both the excited state of the polymer and the excited state of the triphenylsulfonium salt.

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Nigel P. Hacker and Kevin M. Welsh "Mechanistic studies on the poly(4-tert-butoxycarbonyloxystyrene)/triphenylsulfonium salt photoinitiation process", Proc. SPIE 1466, Advances in Resist Technology and Processing VIII, (1 June 1991); https://doi.org/10.1117/12.46387

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