Effect of oxygen on optical properties of yttria thin films

Xuantong Ying; Albert Feldman; Edward N. Farabaugh

doi:10.1117/12.47184

1 November 1991 Effect of oxygen on optical properties of yttria thin films

Xuantong Ying, Albert Feldman, Edward N. Farabaugh

Proceedings Volume 1519, International Conference on Thin Film Physics and Applications; (1991) https://doi.org/10.1117/12.47184
Event: International Conference on Thin Film Physics and Applications, 1991, Shanghai, China

Abstract

A series of yttria optical thin films was prepared under different oxygen partial pressures by electron beam evaporation. A multiparameter nonlinear curve fit method was used to determine the refractive index, absorption coefficient, and thickness of these films. The experimental result indicates the partially oxidized materials inside the films that reduce the transmittance of the films could be oxidized by oxygen backfilled into deposition chamber during the evaporation process to produce optical yttria thin films with low absorption coefficient.

Citation Download Citation

Xuantong Ying, Albert Feldman, and Edward N. Farabaugh "Effect of oxygen on optical properties of yttria thin films", Proc. SPIE 1519, International Conference on Thin Film Physics and Applications, (1 November 1991); https://doi.org/10.1117/12.47184

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