Low loss mirrors @ 514 nm for large interferometer optics

Harry H. Bauer; Erwin Nuessler

doi:10.1117/12.192135

4 November 1994 Low loss mirrors at 514 nm for large interferometer optics

Harry H. Bauer, Erwin Nuessler

Proceedings Volume 2253, Optical Interference Coatings; (1994) https://doi.org/10.1117/12.192135
Event: 1994 International Symposium on Optical Interference Coatings, 1994, Grenoble, France

Abstract

For building gravitational wave detectors large interferometer mirrors with extreme low total losses, especially low absorption losses are required. With Ion Beam Sputter Technology total losses of a few ten ppm are standard on small substrates e.g. 1 inch diameter. For the optimization of thickness uniformity on large substrates, a special double masking technique has been introduced into the coating process. Recent results for the losses of large optics at 512 nm are presented. The thickness uniformity on a 240 mm diameter substrate including the mirror center is better than +/- 0.25%. The contribution of the HR coatings to the spherical aberration of the mirrors is of the order of (lambda) /100. The absorption losses are typically below 2 ppm. The total losses are typically below 25 ppm.

Citation Download Citation

Harry H. Bauer and Erwin Nuessler "Low loss mirrors at 514 nm for large interferometer optics", Proc. SPIE 2253, Optical Interference Coatings, (4 November 1994); https://doi.org/10.1117/12.192135

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