Fabrication of advanced x-ray optics with magnetron minisource arrays

Alan F. Jankowski; R. J. Foreman; Daniel M. Makowiecki

doi:10.1117/12.51266

1 January 1992 Fabrication of advanced x-ray optics with magnetron minisource arrays

Alan F. Jankowski, R. J. Foreman, Daniel M. Makowiecki

Proceedings Volume 1547, Multilayer Optics for Advanced X-Ray Applications; (1992) https://doi.org/10.1117/12.51266
Event: San Diego, '91, 1991, San Diego, CA, United States

Abstract

A process for direct application of multilayered coatings to large area (180 cm2) planar or curved optical surfaces has been developed. Small diameter (2.54 cm) sputter sources are appropriately configured in an array for the deposition of multilayered coatings on virtually any optical surface. Potential application in soft x-ray projection lithography is examined for the deposition of Mo/Si multilayers with a uniform, 6.5 - 7 nm, layer pair spacing onto 15.2 cm diameter silicon wafers. Layer pair spacing variations less than 1.5%, over surface areas exceeding 120 cm2, are measured using Cu (Kappa) (alpha) grazing incidence diffraction.

Citation Download Citation

Alan F. Jankowski, R. J. Foreman, and Daniel M. Makowiecki "Fabrication of advanced x-ray optics with magnetron minisource arrays", Proc. SPIE 1547, Multilayer Optics for Advanced X-Ray Applications, (1 January 1992); https://doi.org/10.1117/12.51266

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