Paper
1 January 1992 Repair of high-performance multilayer coatings
David P. Gaines, Natale M. Ceglio, Stephen P. Vernon, Michael K. Krumrey, Peter Mueller
Author Affiliations +
Abstract
Fabrication and environmental damage issues may require that the multilayer x-ray reflection coatings used in soft x-ray projection lithography be replaced or repaired. Two repair strategies were investigated. The first was to overcoat defective multilayers with a new multilayer. The feasibility of this approach was demonstrated by depositing high reflectivity (61% at 130 A) molybdenum silicon (Mo/Si) multilayers onto fused silica figured optics that had already been coated with a Mo/Si multilayer. Because some types of damage mechanisms and fabrication errors are not repairable by this method, a second method of repair was investigated. The multilayer was stripped from the optical substrate by etching a release layer which was deposited onto the substrate beneath the multilayer. The release layer consisted of a 1000 A aluminum film deposited by ion beam sputtering or by electron beam evaporation, with a 300 A SiO protective overcoat. The substrates were superpolished zerodur optical flats. The normal incidence x-ray reflectivity of multilayers deposited on these aluminized substrates was degraded, presumably due to roughness of the aluminum films. Multilayers, and the underlying release layers, have been removed without damaging the substrates.
© (1992) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
David P. Gaines, Natale M. Ceglio, Stephen P. Vernon, Michael K. Krumrey, and Peter Mueller "Repair of high-performance multilayer coatings", Proc. SPIE 1547, Multilayer Optics for Advanced X-Ray Applications, (1 January 1992); https://doi.org/10.1117/12.51283
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CITATIONS
Cited by 9 scholarly publications.
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KEYWORDS
Multilayers

Reflectivity

Aluminum

X-rays

Near infrared

Surface roughness

Wafer-level optics

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