Direct-current (DC) magnetron sputtering for optical coatings

Paolo Lagana; Carlo Misiano; Enrico Simonetti

doi:10.1117/12.185805

7 September 1994 Direct-current magnetron sputtering for optical coatings

Paolo Lagana, Carlo Misiano, Enrico Simonetti

Proceedings Volume 2262, Optical Thin Films IV: New Developments; (1994) https://doi.org/10.1117/12.185805
Event: SPIE's 1994 International Symposium on Optics, Imaging, and Instrumentation, 1994, San Diego, CA, United States

Abstract

The advantages of optical coatings realized by Sputtering versus thermal evaporation by crucible or Electron Gun, are very well known, but this technique is used only partially for dielectric coatings despite of a wide use in semiconductors and microcircuits, due to the slowness of RF Sputtering processes when starting from dielectric targets. This paper describes a DC Reactive Magnetron Sputtering technique from metal target set up at Ce.Te.V. for deposition of multilayer coatings, with cycle times comparable-or even faster-than conventional solution. The advantages of this process consist in obtaining films with high optical and mechanical performances with high repeatability on room temperature substrates. Pumping cycle can thus be faster and dead time for substrates heating and cooling down can be avoided, characteristics which plastic substrates can particularly take advantage of. Performances of the realized coatings on glass and plastic substrates, together with cycle time and material costs, are finally compared to results obtainable by Electron Beam Gun Reactive Deposition.

Citation Download Citation

Paolo Lagana, Carlo Misiano, and Enrico Simonetti "Direct-current magnetron sputtering for optical coatings", Proc. SPIE 2262, Optical Thin Films IV: New Developments, (7 September 1994); https://doi.org/10.1117/12.185805

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