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Proceedings Article

Configuration optimization and sensitivity comparison among thermal lens, photothermal deflection, and interference detection techniques

[+] Author Affiliations
Bincheng Li, Eberhard Welsch

Friedrich-Schiller-Univ. Jena (Germany)

Proc. SPIE 3578, Laser-Induced Damage in Optical Materials: 1998, 594 (April 7, 1999); doi:10.1117/12.344458
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From Conference Volume 3578

  • Laser-Induced Damage in Optical Materials: 1998
  • Gregory J. Exarhos; Arthur H. Guenther; Mark R. Kozlowski; Keith L. Lewis; M. J. Soileau
  • Boulder, CO | September 28, 1998

abstract

Photothermal techniques, such as probe beam deflection and thermal lens detection, have been widely used for low absorption measurement, thermal characterization, and laser- induced damage detection of optical coatings. In specially configured photothermal techniques, the probe beam either detects the photothermally induced refractive index change inside the sample via propagation through the interacting region in the measured sample, or detects the surface displacement via reflection from the deformed surface. Usually, due to the very low absorption of the sample or/and the short interaction length, a very high sensitivity is required for such applications. It is therefore of importance to maximize the sensitivity for each measurement, by selecting appropriate detection scheme and optimizing the performance of the selected scheme. In this paper, we first maximize the sensitivity of these photothermal techniques by configuration optimization, then compare their maximum sensitivity. The applicability of the pulsed photothermal techniques to optical coating characterization is also discussed.

© (1999) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

Bincheng Li and Eberhard Welsch
"Configuration optimization and sensitivity comparison among thermal lens, photothermal deflection, and interference detection techniques", Proc. SPIE 3578, Laser-Induced Damage in Optical Materials: 1998, 594 (April 7, 1999); doi:10.1117/12.344458; http://dx.doi.org/10.1117/12.344458


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