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Proceedings Article

Roughness characterization of ultrasmooth surfaces using common-path interferometry

[+] Author Affiliations
Baishi Wang, S. P. Marchese-Ragona, Thomas C. Bristow

Chapman Instruments (USA)

Proc. SPIE 3619, Surface Characterization for Computer Disks, Wafers, and Flat Panel Displays, 121 (March 29, 1999); doi:10.1117/12.343706
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From Conference Volume 3619

  • Surface Characterization for Computer Disks, Wafers, and Flat Panel Displays
  • John C. Stover
  • San Jose, CA | January 23, 1999

abstract

The spatial frequency response, height sensitivity and system noise of a scanning common-path interferometer have been studied. The impulse response function and the frequency transfer function of the system are obtained analytically using Fresnel diffraction integral. Experimental results are also given. The results show that the system covers a broad spatial frequency range from 2 X 10-5/micrometer to 3/micrometer. The height sensitivity of the system is better than 0.01 angstrom. System stationary noise less than 0.1 angstrom RMS is achievable without additional noise reduction post-process. Measurement of an ultra-smooth silicon substrate with a sub-angstrom roughness is successfully demonstrated. Measurement of a smooth glass substrate is also shown.

© (1999) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

Baishi Wang ; S. P. Marchese-Ragona and Thomas C. Bristow
"Roughness characterization of ultrasmooth surfaces using common-path interferometry", Proc. SPIE 3619, Surface Characterization for Computer Disks, Wafers, and Flat Panel Displays, 121 (March 29, 1999); doi:10.1117/12.343706; http://dx.doi.org/10.1117/12.343706


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