Overview of SCALPEL mask technology

Gregory R. Bogart; Anthony E. Novembre; Avi Kornblit; Milton L. Peabody Jr.; Reginald C. Farrow; Myrtle I. Blakey; Richard J. Kasica; James Alexander Liddle; Thomas E. Saunders; Chester S. Knurek

doi:10.1117/12.346223

23 April 1999 Overview of SCALPEL mask technology

Gregory R. Bogart, Anthony E. Novembre, Avi Kornblit, Milton L. Peabody Jr., Reginald C. Farrow, Myrtle I. Blakey, Richard J. Kasica, James Alexander Liddle, Thomas E. Saunders, Chester S. Knurek

Author Affiliations +

Proceedings Volume 3665, 15th European Conference on Mask Technology for Integrated Circuits and Microcomponents '98; (1999) https://doi.org/10.1117/12.346223
Event: 15th European Conference on Mask Technology for Integrated Circuits and Micro-Components, 1998, Munich, Germany

Abstract

Scattering with angular limitation projection electron beam lithography is a true 4X reduction technology that capitalizes on high resolution capabilities from electron beam exposure and high throughput capability from projection.

Citation Download Citation

Gregory R. Bogart, Anthony E. Novembre, Avi Kornblit, Milton L. Peabody Jr., Reginald C. Farrow, Myrtle I. Blakey, Richard J. Kasica, James Alexander Liddle, Thomas E. Saunders, and Chester S. Knurek "Overview of SCALPEL mask technology", Proc. SPIE 3665, 15th European Conference on Mask Technology for Integrated Circuits and Microcomponents '98, (23 April 1999); https://doi.org/10.1117/12.346223

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