Simulation of resist heating using TEMPTATION software with different models of electron-beam energy deposition

Igor Yu. Kuzmin

doi:10.1117/12.351126

25 June 1999 Simulation of resist heating using TEMPTATION software with different models of electron-beam energy deposition

Igor Yu. Kuzmin

Author Affiliations +

Proceedings Volume 3676, Emerging Lithographic Technologies III; (1999) https://doi.org/10.1117/12.351126
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

In electron lithography, resist heating is a serious practical problem that requires proper modeling. To decrease complexity of the problem, simplified representations of a single electron heat source were examined. This was shown that simplified descriptions can lead to significant errors in temperature simulation. These simple models can only be used for temperature simulation at a long time/long distance from the current electron flash. An analytic mode of electron scattering and Monte Carlo modeling have shown comparably good accuracy when used for thermal simulations. They both were embedded in TEMPTATION software tool.

Citation Download Citation

Igor Yu. Kuzmin "Simulation of resist heating using TEMPTATION software with different models of electron-beam energy deposition", Proc. SPIE 3676, Emerging Lithographic Technologies III, (25 June 1999); https://doi.org/10.1117/12.351126

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