Full Content is available to subscribers

Subscribe/Learn More  >
Proceedings Article

Effects of mask roughness and condenser scattering in EUVL systems

[+] Author Affiliations
Neil A. Beaudry, Tomas D. Milster

Optical Sciences Ctr./Univ. of Arizona (USA)

Proc. SPIE 3676, Emerging Lithographic Technologies III, 653 (June 25, 1999); doi:10.1117/12.351140
Text Size: A A A
From Conference Volume 3676

  • Emerging Lithographic Technologies III
  • Yuli Vladimirsky
  • Santa Clara, CA | March 14, 1999

abstract

The wavefront reflected from extreme UV lithography mirror and mask surfaces can contain a non-negligible amount of phase variation due to roughness of the mirror surface and variations in multilayer thin-film coatings. We examine the characteristics of image and pattern formation as a function of phase variations originating at the mask surface and at condenser mirrors. A theoretical development and a Monte- Carlo simulation are used to show relationships between statistics of the phase variations and the mask pattern, coherence factor, and numerical aperture of the projection camera. Results indicate that it is possible to produce nearly 1 percent line-edge roughness in a photoresist pattern from moderate values of phase variations.

© (1999) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

Neil A. Beaudry and Tomas D. Milster
"Effects of mask roughness and condenser scattering in EUVL systems", Proc. SPIE 3676, Emerging Lithographic Technologies III, 653 (June 25, 1999); doi:10.1117/12.351140; http://dx.doi.org/10.1117/12.351140


Access This Proceeding
Sign in or Create a personal account to Buy this proceeding ($15 for members, $18 for non-members).

Figures

Tables

NOTE:
Citing articles are presented as examples only. In non-demo SCM6 implementation, integration with CrossRef’s "Cited By" API will populate this tab (http://www.crossref.org/citedby.html).

Some tools below are only available to our subscribers or users with an online account.

Related Content

Customize your page view by dragging & repositioning the boxes below.

Related Book Chapters

Topic Collections

Advertisement


  • Don't have an account?
  • Subscribe to the SPIE Digital Library
  • Create a FREE account to sign up for Digital Library content alerts and gain access to institutional subscriptions remotely.
Access This Proceeding
Sign in or Create a personal account to Buy this proceeding ($15 for members, $18 for non-members).
Access This Proceeding
Sign in or Create a personal account to Buy this article ($15 for members, $18 for non-members).
Access This Chapter

Access to SPIE eBooks is limited to subscribing institutions and is not available as part of a personal subscription. Print or electronic versions of individual SPIE books may be purchased via SPIE.org.