EUVL projection-camera alignment methods

Michael R. Descour; Mark R. Willer; Dana S. Clarke; Jose M. Sasian

doi:10.1117/12.351141

25 June 1999 EUVL projection-camera alignment methods

Michael R. Descour, Mark R. Willer, Dana S. Clarke, Jose M. Sasian

Proceedings Volume 3676, Emerging Lithographic Technologies III; (1999) https://doi.org/10.1117/12.351141
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

Comparison of misalignment modes associated with metrology data nd projection-camera performance can be used to increase the sensitivity of metrology measurements to specific camera-performance specifications such as chief-ray distortion. Selection of measurable misalignment modes in the case of metrology and interesting misalignment modes in the case of camera performance is based on a determination of whether a mode can 'fit' into a projection camera given actuator-stroke and mirror tilt bounds. Measurement and interest subspaces are next compared using distance between subspaces. As an example of this type of analysis, we find that exit-pupil wavefront measurements can be made more sensitive to chief-ray distortion if these measurements are collected at field positions outside the ring field of view of an EUVL projection camera.

Citation Download Citation

Michael R. Descour, Mark R. Willer, Dana S. Clarke, and Jose M. Sasian "EUVL projection-camera alignment methods", Proc. SPIE 3676, Emerging Lithographic Technologies III, (25 June 1999); https://doi.org/10.1117/12.351141

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