Reflectivity of Mo/Si multilayer systems for EUVL

Eric Louis; Andrey E. Yakshin; Peter C. Goerts; Salim Abdali; Edward L. G. Maas; R. Stuik; Fred Bijkerk; Detlef Schmitz; Frank Scholze; Gerhard Ulm; Markus Haidl

doi:10.1117/12.351079

25 June 1999 Reflectivity of Mo/Si multilayer systems for EUVL

Eric Louis, Andrey E. Yakshin, Peter C. Goerts, Salim Abdali, Edward L. G. Maas, R. Stuik, Fred Bijkerk, Detlef Schmitz, Frank Scholze, Gerhard Ulm, Markus Haidl

Author Affiliations +

Proceedings Volume 3676, Emerging Lithographic Technologies III; (1999) https://doi.org/10.1117/12.351079
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

Normal-incidence reflectivity data of Mo/Si multilayer systems are being reported for the EUV wavelength range.

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Eric Louis, Andrey E. Yakshin, Peter C. Goerts, Salim Abdali, Edward L. G. Maas, R. Stuik, Fred Bijkerk, Detlef Schmitz, Frank Scholze, Gerhard Ulm, and Markus Haidl "Reflectivity of Mo/Si multilayer systems for EUVL", Proc. SPIE 3676, Emerging Lithographic Technologies III, (25 June 1999); https://doi.org/10.1117/12.351079

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