Dimensional metrology with the NIST calibrated atomic force microscope

Ronald G. Dixson; Rainer G.J. Koening; Vincent Wen-Chieh Tsai; Joseph Fu; Theodore V. Vorburger

doi:10.1117/12.350822

14 June 1999 Dimensional metrology with the NIST calibrated atomic force microscope

Ronald G. Dixson, Rainer G.J. Koening, Vincent Wen-Chieh Tsai, Joseph Fu, Theodore V. Vorburger

Proceedings Volume 3677, Metrology, Inspection, and Process Control for Microlithography XIII; (1999) https://doi.org/10.1117/12.350822
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

AFMs are increasingly used in the semiconductor industry as tools for sub-micrometer dimensional metrology. The scale of an AFM must be calibrated in order to perform accurate measurements. We have designed and developed the calibrated AFM (C-AFM) at the NIST to calibrate standards. Specifically, our primary calibrations are expected to be of combined pitch/height, or 3D magnification standards for AFM. THe C-AFM has metrology traceable to the International System of Units meter for all three axes. This is accomplished through the integration of a flexure x-y translation stage, heterodyne laser interferometers, and a z-axis piezoelectric actuator with an integrated capacitance sensor. Our first pitch measurements for an outside customer were recently compete, in which we were able to report relative expanded uncertainties as low as 1 percent on sub- micrometer pitches. The uncertainty budget for these measurements includes the effect of sample non-uniformity, which is the dominant contribution for some of the reported uncertainties. Four samples were measured - two with grid patterns and two with grid recently made considerable improvements in our uncertainty budget for step height measurements. For example, we recently achieved 0.2 nm expanded uncertainty on a 20 nm step, and achieved 0.008 nm expanded uncertainty in the measurement of the approximately 0.3 nm single atom step on Si. We also participated in the recently competed first round of the NIST linewidth correlation project, in which linewidht measurements obtained from different methods are compared. In this paper, we will report on the current status of the C-AFM, and on our plans for further development.

Citation Download Citation

Ronald G. Dixson, Rainer G.J. Koening, Vincent Wen-Chieh Tsai, Joseph Fu, and Theodore V. Vorburger "Dimensional metrology with the NIST calibrated atomic force microscope", Proc. SPIE 3677, Metrology, Inspection, and Process Control for Microlithography XIII, (14 June 1999); https://doi.org/10.1117/12.350822

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