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Proceedings Article

Color filter array for CCD and CMOS image sensors using a chemically amplified thermally cured pre-dyed positive-tone photoresist for 365-nm lithography

[+] Author Affiliations
Harris R. Miller

Digital Optics Corp. (USA)

Proc. SPIE 3678, Advances in Resist Technology and Processing XVI, 1083 (June 11, 1999); doi:10.1117/12.350159
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From Conference Volume 3678

  • Advances in Resist Technology and Processing XVI
  • Will Conley
  • Santa Clara, CA | March 14, 1999

abstract

'On-chip' color filters are commonly used to convert monochromatic, solid-state image sensor into color sensors because they offer a good compromise between cost and resolution for digital cameras. The color filters are fabricated directly onto the surface of the CMOS or CCD image sensors, which generates a mosaic array of pixel-size filter elements. Diazonaphthoquinone-novolak photoresist is used to produce these filters by successively depositing and patterning each color layer. The choice of colors can vary from additive to subtractive or combinations of both.

© (1999) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

Harris R. Miller
"Color filter array for CCD and CMOS image sensors using a chemically amplified thermally cured pre-dyed positive-tone photoresist for 365-nm lithography", Proc. SPIE 3678, Advances in Resist Technology and Processing XVI, 1083 (June 11, 1999); doi:10.1117/12.350159; http://dx.doi.org/10.1117/12.350159


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