Paper
26 July 1999 Application of blazed gratings for determination of equivalent primary azimuthal aberrations
Joseph P. Kirk, Christopher J. Progler
Author Affiliations +
Abstract
Aberrations are determined from wafers exposed using a test reticle having blazed gratings with orientations from 0 to 337.5 degrees in increments of 22.5 degrees. The image of the phase grating is micro stepped thorough focus on the surface of high absorption photoresist. A second blanket exposure is applied to the latent images to make the developed resist images have a surface relief linearly related to the aerial image intensity. The first order diffraction efficiency of this surface grating is directly propagational to the first harmonic of the surface relief. This diffraction efficiency is recorded as a digitized dark- field image and processed to evalute the aberrations. These images are simulated and matched to those recorded in the photoresist by adjusting the aberrations to achieve a best match. The primary azimuthal aberration contributions are separated by Fourier analysis into coma, astigmatism, 3 leaf clover, etc. and laser used to indicate lens quality. Several grating frequencies are required to separate higher order components of each azimuthal aberration. Only one grating frequency is used in the data reported here and all orders of each azimuthal aberration are lumped into equivalent primary azimuthal aberrations.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Joseph P. Kirk and Christopher J. Progler "Application of blazed gratings for determination of equivalent primary azimuthal aberrations", Proc. SPIE 3679, Optical Microlithography XII, (26 July 1999); https://doi.org/10.1117/12.354375
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Cited by 6 scholarly publications and 13 patents.
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KEYWORDS
Monochromatic aberrations

Reticles

Image processing

Photoresist materials

Semiconducting wafers

Diffraction gratings

Diffraction

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