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Proceedings Article

Novel aberration monitor for optical lithography

[+] Author Affiliations
Peter Dirksen, Casper A. H. Juffermans

Philips Research Labs. (Belgium)

Rudy J. M. Pellens

Philips Research Labs. (Netherlands)

Mireille Maenhoudt, Peter De Bisschop

IMEC (Belgium)

Proc. SPIE 3679, Optical Microlithography XII, 77 (July 26, 1999); doi:10.1117/12.354385
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From Conference Volume 3679

  • Optical Microlithography XII
  • Luc Van den Hove
  • Santa Clara, CA | March 14, 1999

abstract

The aberration monitor allows independent determination of spherical, coma, astigmatism and three point in a single experiment using existing equipment. The monitor consists of a circular phase object, with a diameter of approximately (lambda) /NA and a phase depth of (lambda) /2. Due to the relative large diameter, the image prints as a narrow ring into the resist. Without aberrations its contours are concentric circles. Aberrations deform the ring in a characteristic way. A detailed analysis of the ring shape through focus identifies the aberrations of the projection lens. A linear aberration model is compared with simulations. Experimental results of various aberrations are shown and ar correlated to line width measurements and interferometric lens data.

© (1999) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

Peter Dirksen ; Casper A. H. Juffermans ; Rudy J. M. Pellens ; Mireille Maenhoudt and Peter De Bisschop
"Novel aberration monitor for optical lithography", Proc. SPIE 3679, Optical Microlithography XII, 77 (July 26, 1999); doi:10.1117/12.354385; http://dx.doi.org/10.1117/12.354385


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