Full Content is available to subscribers

Subscribe/Learn More  >
Proceedings Article

Measurement of effective source shift using a grating-pinhole mask

[+] Author Affiliations
Kazuya Sato, Satoshi Tanaka, Tadahito Fujisawa, Soichi Inoue

Toshiba Corp. (Japan)

Proc. SPIE 3679, Optical Microlithography XII, 99 (July 26, 1999); doi:10.1117/12.354402
Text Size: A A A
From Conference Volume 3679

  • Optical Microlithography XII
  • Luc Van den Hove
  • Santa Clara, CA | March 14, 1999

abstract

A methodology for measuring the effective illumination source shift in exposure tools has been established. A grating-pinhole mask is placed upside-down on mask stage, and exposed. This mask consists of square pinholes with 80 micrometers square and 2D square lattices in these pinholes. The pitch of the grating pattern is suitably designed so that the 1st-order diffraction beams can illuminate the edge of the pupil of the projection optics. Both the shape of illumination source and the silhouette of the pupil of the projection optics are projected on the wafer located by normal photoresist. A conventional optical microscope is available for easily observing the photoresist patterns. The grating-pinhole consisting of attenuated phase-shifting structure has found to be also effective to measure both effective coherence factor and intensity non-uniformity of effective illumination source.

© (1999) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

Kazuya Sato ; Satoshi Tanaka ; Tadahito Fujisawa and Soichi Inoue
"Measurement of effective source shift using a grating-pinhole mask", Proc. SPIE 3679, Optical Microlithography XII, 99 (July 26, 1999); doi:10.1117/12.354402; http://dx.doi.org/10.1117/12.354402


Access This Proceeding
Sign in or Create a personal account to Buy this proceeding ($15 for members, $18 for non-members).

Figures

Tables

NOTE:
Citing articles are presented as examples only. In non-demo SCM6 implementation, integration with CrossRef’s "Cited By" API will populate this tab (http://www.crossref.org/citedby.html).

Some tools below are only available to our subscribers or users with an online account.

Related Content

Customize your page view by dragging & repositioning the boxes below.

Related Book Chapters

Topic Collections

Advertisement
  • Don't have an account?
  • Subscribe to the SPIE Digital Library
  • Create a FREE account to sign up for Digital Library content alerts and gain access to institutional subscriptions remotely.
Access This Proceeding
Sign in or Create a personal account to Buy this proceeding ($15 for members, $18 for non-members).
Access This Proceeding
Sign in or Create a personal account to Buy this article ($15 for members, $18 for non-members).
Access This Chapter

Access to SPIE eBooks is limited to subscribing institutions and is not available as part of a personal subscription. Print or electronic versions of individual SPIE books may be purchased via SPIE.org.