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Proceedings Article

Numerical reference models for optical metrology simulation

[+] Author Affiliations
Gregory L. Wojcik, John Mould, Jr.

Weidlinger Associates, Inc. (USA)

Egon Marx

National Institute of Standards and Technology (USA)

Mark P. Davidson

Spectel Co. (USA)

Proc. SPIE 1673, Integrated Circuit Metrology, Inspection, and Process Control VI, 70 (June 1, 1992); doi:10.1117/12.59785
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From Conference Volume 1673

  • Integrated Circuit Metrology, Inspection, and Process Control VI
  • Michael T. Postek, Jr.
  • San Jose, CA | March 01, 1992

abstract

Optical modeling on the computer can aid R&D efforts to enhance metrology methods, and similarly for lithography, alignment, and particulate monitoring. However, full exploitation of optical modeling is hindered by the lack of appropriate benchmarks for verifying algorithms and evaluating approximations. To help remedy this situation we describe a preliminary set of scalar, 2-D numerical reference models (NRMs). These include isolated thin and thick lines, periodic lines, and an isolated trench. Scattered fields are compared for three different solution methods, based on time-domain finite elements, boundary integrals, and a waveguide model. Correlation is good in general, although important differences are seen in both code accuracy and performance. NRM generalizations are suggested that accommodate 3-D effects, imaging, and experimental verification.

© (1992) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

Gregory L. Wojcik ; John Mould, Jr. ; Egon Marx and Mark P. Davidson
"Numerical reference models for optical metrology simulation", Proc. SPIE 1673, Integrated Circuit Metrology, Inspection, and Process Control VI, 70 (June 1, 1992); doi:10.1117/12.59785; http://dx.doi.org/10.1117/12.59785


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