New excimer ultraviolet sources for photo-assisted deposition of thin films: an alternative to excimer-laser-induced deposition

Ian W. Boyd; J. Y. Zhang; Philippe Bergonzo

doi:10.1117/12.206260

10 April 1995 New excimer ultraviolet sources for photo-assisted deposition of thin films: an alternative to excimer-laser-induced deposition

Ian W. Boyd, J. Y. Zhang, Philippe Bergonzo

Author Affiliations +

Proceedings Volume 2403, Laser-Induced Thin Film Processing; (1995) https://doi.org/10.1117/12.206260
Event: Photonics West '95, 1995, San Jose, CA, United States

Abstract

The principles and properties of vacuum ultraviolet (VUV) and ultraviolet (UV) light generated from a new type of excimer lamp are described. Compared with other lamps, these VUV and UV light sources can provide high photon fluxes over large-areas. These VUV and UV sources have been used to initiate the photo-deposition of dielectric and metallic thin films. The photo-deposited film properties, determined using ellipsometry, FTIR spectroscopy, UV spectrophotometer, and electrical measurements, showed that good quality films could be produced. Multilayered films of silicon oxide, silicon nitride, and silicon oxynitride can also be produced at low temperatures (below 300 degree(s)C). Very high deposition rates (500 angstrom/min) have been obtained by irradiating silane and oxygen gas mixture at low temperatures. This technique being relatively inexpensive in capital outlay, simple to apply, and readily scalable to large-areas provides interesting perspectives for optical and electronic applications.

Citation Download Citation

Ian W. Boyd, J. Y. Zhang, and Philippe Bergonzo "New excimer ultraviolet sources for photo-assisted deposition of thin films: an alternative to excimer-laser-induced deposition", Proc. SPIE 2403, Laser-Induced Thin Film Processing, (10 April 1995); https://doi.org/10.1117/12.206260

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