Dry etching for the fabrication of flat panel displays

Curt Barratt; David J. Johnson; Chris Constantine

doi:10.1117/12.207515

24 April 1995 Dry etching for the fabrication of flat panel displays

Curt Barratt, David J. Johnson, Chris Constantine

Proceedings Volume 2408, Liquid Crystal Materials, Devices, and Displays; (1995) https://doi.org/10.1117/12.207515
Event: IS&T/SPIE's Symposium on Electronic Imaging: Science and Technology, 1995, San Jose, CA, United States

Abstract

The technique of dry etching as applied to the patterning of thin films is described, and compared to wet etching in terms of the etch precision and in terms of the usage and disposal of etch chemicals. The etch requirements of three representative display technologies (AMLCD, FED and EL) are outlined, and the range of plasma etch processes which are applicable to these requirements is described.

Citation Download Citation

Curt Barratt, David J. Johnson, and Chris Constantine "Dry etching for the fabrication of flat panel displays", Proc. SPIE 2408, Liquid Crystal Materials, Devices, and Displays, (24 April 1995); https://doi.org/10.1117/12.207515

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available