Broadband antireflection coatings deposited with ion-assisted evaporation

Sven Laux; Norbert Kaiser; Hansjoerg S. Niederwald; Michael Mertin; Henrik Ehlers; Detlev Ristau

doi:10.1117/12.360066

7 September 1999 Broadband antireflection coatings deposited with ion-assisted evaporation

Sven Laux, Norbert Kaiser, Hansjoerg S. Niederwald, Michael Mertin, Henrik Ehlers, Detlev Ristau

Proceedings Volume 3738, Advances in Optical Interference Coatings; (1999) https://doi.org/10.1117/12.360066
Event: Optical Systems Design and Production, 1999, Berlin, Germany

Abstract

SiO₂, Ta₂O₅ and MgF₂ have been deposited by electron beam evaporation under bombardment of ions generated by three different ion or plasma sources. Multilayer systems containing 5 to 12 layers have been designed and realized. The maximum reflectance R of a glass/air interface can be reduced down to R < 0.5 percent in a spectral region of 400 nm to 700 nm with each of such AR coatings mostly exceeds that of all-oxide system in the shorter wavelength region. With scanning scratch test the scratch resistance of the coatings have been determined relative to each other.

Citation Download Citation

Sven Laux, Norbert Kaiser, Hansjoerg S. Niederwald, Michael Mertin, Henrik Ehlers, and Detlev Ristau "Broadband antireflection coatings deposited with ion-assisted evaporation", Proc. SPIE 3738, Advances in Optical Interference Coatings, (7 September 1999); https://doi.org/10.1117/12.360066

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