Fabrication of multilevel diffractive elements in SiO2 by electron-beam lithography and proportional etching

Pasi Laakkonen; Jari Lautanen; Janne Simonen; Jari Pekka Turunen; Veli-Pekka Leppanen; Timo Jaaskelainen

doi:10.1117/12.347805

7 May 1999 Fabrication of multilevel diffractive elements in SiO₂ by electron-beam lithography and proportional etching

Pasi Laakkonen, Jari Lautanen, Janne Simonen, Jari Pekka Turunen, Veli-Pekka Leppanen, Timo Jaaskelainen

Proceedings Volume 3740, Optical Engineering for Sensing and Nanotechnology (ICOSN '99); (1999) https://doi.org/10.1117/12.347805
Event: Optical Engineering for Sensing and Nanotechnology (ICOSN '99), 1999, Yokohama, Japan

Abstract

A new negative low-contrast electron beam resist X AR-N 7700/18 is used in multilevel structuring with direct electron beam exposure. The developed multilevel resist profiles are transferred into SiO₂ substrates with reactive ion etching (RIE) and the desired profile depths are achieved by a proper adjustment of the pressure during the etching process. The tolerance of profile depth errors is found to be less than 2.5%. Examples of multilevel pixel-structured gratings and diffractive lenses are given.

Citation Download Citation

Pasi Laakkonen, Jari Lautanen, Janne Simonen, Jari Pekka Turunen, Veli-Pekka Leppanen, and Timo Jaaskelainen "Fabrication of multilevel diffractive elements in SiO₂ by electron-beam lithography and proportional etching", Proc. SPIE 3740, Optical Engineering for Sensing and Nanotechnology (ICOSN '99), (7 May 1999); https://doi.org/10.1117/12.347805

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