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Proceedings Article

Phase mask for high focal depth

[+] Author Affiliations
Jorge Ojeda-Castaneda

Univ. of Las Americas (Mexico)

Albertina Castro

Instituto Nacional de Astrofisica, Optica y Electronica (Mexico)

Javier Santamaria

SENER Ingenieria y Sistemas, SA (Spain)

Proc. SPIE 3749, 18th Congress of the International Commission for Optics, 14 (July 19, 1999); doi:10.1117/12.355052
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From Conference Volume 3749

  • 18th Congress of the International Commission for Optics
  • Alexander J. Glass; Joseph W. Goodman; Milton Chang; Arthur H. Guenther; Toshimitsu Asakura
  • San Francisco, CA | August 02, 1999

abstract

We present a phase mask that substantially reduces the influence of focus error of an optical system; while preserving light gathering power, and lateral resolution. Numerical simulations and first experimental results are shown.

© (1999) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

Jorge Ojeda-Castaneda ; Albertina Castro and Javier Santamaria
"Phase mask for high focal depth", Proc. SPIE 3749, 18th Congress of the International Commission for Optics, 14 (July 19, 1999); doi:10.1117/12.355052; http://dx.doi.org/10.1117/12.355052


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