Optical system design issues in development of projection camera for EUV lithography

Tanya E. Jewell

doi:10.1117/12.209170

19 May 1995 Optical system design issues in development of projection camera for EUV lithography

Tanya E. Jewell

Proceedings Volume 2437, Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V; (1995) https://doi.org/10.1117/12.209170
Event: SPIE's 1995 Symposium on Microlithography, 1995, Santa Clara, CA, United States

Abstract

Optical system design issues are described in development of a four- mirror 4x reduction ring-field system for EUV projection lithography at 13 nm wavelength.

Citation Download Citation

Tanya E. Jewell "Optical system design issues in development of projection camera for EUV lithography", Proc. SPIE 2437, Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V, (19 May 1995); https://doi.org/10.1117/12.209170

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