Lithography and the future of Moore's law

Gordon E. Moore

doi:10.1117/12.209244

26 May 1995 Lithography and the future of Moore's law

Gordon E. Moore

Proceedings Volume 2440, Optical/Laser Microlithography VIII; (1995) https://doi.org/10.1117/12.209244
Event: SPIE's 1995 Symposium on Microlithography, 1995, Santa Clara, CA, United States

Abstract

The definition of"Moore's Law" has come to refer to almost anything related to the semiconductor industry that when plotted on semi-log paper approximates a straight line. I hesitate to review it's origins and by doing so restrict it's definition. However, today I will review the history and past performance relative to predictions and show where the advances have come from. I will leave the ftiture performance up to you. Certainly continuing on the same slope doesn't get any easier. It presents a difficult challenge to the industry. The original paper that postulated the first version ofthe "law" was an article I wrote for the 35th anniversary issue ofElectronics Magazine in 1965. My assignment was to predict what was going to happen in the semiconductor components industry over the next ten years --to 1975 . In 1965 the integrated circuit was only a few years old and in many cases was not very well accepted. There was still a large contingent in the user community who wanted to design their own circuits and who considered the job of the semiconductor industry to be to supply them with transistors and diodes so they could get on with theirjobs. I was trying to emphasize the fact that integrated circuits really did have an important role to play.

Citation Download Citation

Gordon E. Moore "Lithography and the future of Moore's law", Proc. SPIE 2440, Optical/Laser Microlithography VIII, (26 May 1995); https://doi.org/10.1117/12.209244

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