Edge diffraction in Monte Carlo ray tracing

Edward R. Freniere; G. Groot Gregory; Richard A. Hassler

doi:10.1117/12.363773

27 September 1999 Edge diffraction in Monte Carlo ray tracing

Edward R. Freniere, G. Groot Gregory, Richard A. Hassler

Proceedings Volume 3780, Optical Design and Analysis Software; (1999) https://doi.org/10.1117/12.363773
Event: SPIE's International Symposium on Optical Science, Engineering, and Instrumentation, 1999, Denver, CO, United States

Abstract

Monte Carlo ray tracing programs are now being used to solve many optical analysis problems in which the entire optomechanical system must be considered. In many analyses, it is desired to consider the effects of diffraction by mechanical edges. Smoothly melding the effects of diffraction, a wave phenomenon, into a ray-tracing program is a significant technical challenge. This paper discusses the suitability of several methods of calculating diffraction for use in ray tracing programs. A method based on the Heisenberg Uncertainty Principle was chosen for use in TracePro, a commercial Monte Carlo ray tracing program, and is discussed in detail.

Citation Download Citation

Edward R. Freniere, G. Groot Gregory, and Richard A. Hassler "Edge diffraction in Monte Carlo ray tracing", Proc. SPIE 3780, Optical Design and Analysis Software, (27 September 1999); https://doi.org/10.1117/12.363773

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