Alan Kozlowski
at Red Zone Concepts LLC
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 29 June 1998 Paper
Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312353
KEYWORDS: Photoresist materials, Lithography, Critical dimension metrology, Manufacturing, Photoresist processing, Photomasks, Structural design, Metals, Industrial chemicals, Semiconducting wafers

Proceedings Article | 26 September 1995 Paper
Proceedings Volume 2640, (1995) https://doi.org/10.1117/12.222639
KEYWORDS: Thin film coatings, Semiconducting wafers, Scanning electron microscopy, Photoresist processing, Photoresist materials, Plating, Gold, Photoresist developing, Photomicroscopy, Image processing

Proceedings Article | 1 July 1991 Paper
Wayne Ostrout, William Hiatt, Alan Kozlowski
Proceedings Volume 1463, (1991) https://doi.org/10.1117/12.44774
KEYWORDS: Manufacturing, Imaging systems, Chemistry, Process control, Semiconducting wafers, Signal to noise ratio, Optical lithography, Signal processing, Lithography, Mathematical modeling

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