Mr. Andre Poock Profile

Andre Poock

Senior Process Engineer at GLOBALFOUNDRIES Dresden Module Two

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Author

Publications (7)

Proceedings Article | 27 May 2009 Paper

Mask parameter variation in the context of the overall variation budget of an advanced logic wafer Fab

Rolf Seltmann, Gert Burbach, Anne Parge, Jens Busch, Tino Hertzsch, Andre Poock, Francois Weisbuch, Andre Holfeld

Proceedings Volume 7470, 747006 (2009) https://doi.org/10.1117/12.835166

KEYWORDS: Photomasks, Semiconducting wafers, Optical lithography, Etching, Transistors, Line width roughness, Logic, Oscillators, Scanners, Metrology

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Proceedings Article | 17 October 2008 Paper

OPC hotspot identification challenges: ORC vs. PWQ on wafer

Andre Poock, Sarah McGowan, Francois Weisbuch, Guido Schnasse, Rajesh Ghaskadvi

Proceedings Volume 7122, 71220Y (2008) https://doi.org/10.1117/12.801574

KEYWORDS: Optical proximity correction, Semiconducting wafers, Inspection, Photomasks, Scanning electron microscopy, Calibration, Lithography, Reticles, Critical dimension metrology, Product engineering

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Proceedings Article | 16 November 2007 Paper

Use of layout automation and design-based metrology for defect test mask design and verification

Chris Spence, Cyrus Tabery, Andre Poock, Arndt Duerr, Thomas Witte, Jan Fiebig, Jan Heumann

Proceedings Volume 6730, 67300P (2007) https://doi.org/10.1117/12.746953

KEYWORDS: Photomasks, Semiconducting wafers, Inspection, Reticles, Optical proximity correction, Metrology, Environmental sensing, Wafer inspection, Critical dimension metrology, Defect detection

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Proceedings Article | 20 October 2006 Paper

Wafer fab mask qualification techniques and limitations

Andre Poock, Stephanie Maelzer, Chris Spence, Cyrus Tabery, Michael Lang, Guido Schnasse, Milko Peikert, Kaustuve Bhattacharyya

Proceedings Volume 6349, 63490U (2006) https://doi.org/10.1117/12.692525

KEYWORDS: Photomasks, Inspection, Semiconducting wafers, Wafer inspection, Reticles, Defect inspection, Defect detection, Wafer testing, Printing, Image resolution

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Proceedings Article | 20 October 2006 Paper

High-resolution mask inspection in advanced fab

Stephanie Maelzer, Andre Poock, Bryan Reese, Kaustuve Bhattacharyya, Farzin Mirzaagha, Stephen Cox, Michael Lang

Proceedings Volume 6349, 63490S (2006) https://doi.org/10.1117/12.686402

KEYWORDS: Inspection, Reticles, Semiconducting wafers, Photomasks, Wafer inspection, Metals, Defect inspection, Lithography, Image transmission, Visualization

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Proceedings Article | 17 December 2003 Paper

Reticle surface contaminants and their relationship to subpellicle particle formation

Brian Grenon, Kaustuve Bhattacharyya, William Volk, Andre Poock

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518105

KEYWORDS: Reticles, Air contamination, Ions, Inspection, Raman spectroscopy, Quartz, Contamination, Chemical analysis, Particles, Pellicles

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Proceedings Article | 26 June 2003 Paper

ACLV-analysis in production and its impact on product performance

Rolf Seltmann, Rolf Stephan, Martin Mazur, Christopher Spence, Bruno La Fontaine, Dirk Stankowski, Andre Poock, Wolfram Grundke

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485337

KEYWORDS: Scanners, Reticles, Manufacturing, Semiconducting wafers, Critical dimension metrology, Optical filters, Contamination, Modulation transfer functions, Logic, Etching

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Showing 5 of 7 publications

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