Dr. Andrea F. Wüest Profile

Dr. Andrea F. Wüest

Project Manager at SUNY Poly SEMATECH

SPIE Involvement:

Author

Publications (15)

Proceedings Article | 8 April 2011 Paper

Paper

Dependence of contamination rates on key parameters in EUV optics

Yashdeep Khopkar, Petros Thomas, Leonid Yankulin, Rashi Garg, Chimaobi Mbanaso, Alin Antohe, Mihir Upadhyaya, Vimal Kumar Kamineni, Yu-Jen Fan, Gregory Denbeaux, Vibhu Jindal, Andrea Wüest, Eric Gullikson

Proceedings Volume 7969, 796923 (2011) https://doi.org/10.1117/12.879491

KEYWORDS: Contamination, Carbon, Extreme ultraviolet, Ruthenium, EUV optics, Polymers, Polymerization, Polymer thin films, Mirrors, Extreme ultraviolet lithography

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Proceedings Article | 23 March 2010 Paper

Paper

Wavelength dependence of carbon contamination on mirrors with different capping layers

Petros Thomas, Leonid Yankulin, Yashdeep Khopkar, Rashi Garg, Chimaobi Mbanaso, Alin Antohe, Yu-Jen Fan, Gregory Denbeaux, Samir Aouadi, Vibhu Jindal, Andrea Wüest

Proceedings Volume 7636, 76361X (2010) https://doi.org/10.1117/12.847015

KEYWORDS: Contamination, Extreme ultraviolet, Carbon, Mirrors, Extreme ultraviolet lithography, Xenon, Error analysis, Neodymium, Ruthenium, Titanium dioxide

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Proceedings Article | 20 March 2010 Paper

Paper

Carbon contamination topography analysis of EUV masks

Yu-Jen Fan, Leonid Yankulin, Petros Thomas, Chimaobi Mbanaso, Alin Antohe, Rashi Garg, Yunfei Wang, Thomas Murray, Andrea Wüest, Frank Goodwin, Sungmin Huh, Aaron Cordes, Patrick Naulleau, Kenneth Goldberg, Iacopo Mochi, Eric Gullikson, Gregory Denbeaux

Proceedings Volume 7636, 76360G (2010) https://doi.org/10.1117/12.846996

KEYWORDS: Carbon, Contamination, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Reflectivity, Printing, Scanning electron microscopy, Inspection, Lithography

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Proceedings Article | 23 March 2009 Paper

Paper

Assumptions and trade-offs of extreme ultraviolet optics contamination modeling

V. Jindal, R. Garg, G. Denbeaux, A. Wüest

Proceedings Volume 7271, 72713Q (2009) https://doi.org/10.1117/12.814188

KEYWORDS: Carbon, Contamination, Molecules, Electrons, Radiation effects, EUV optics, Extreme ultraviolet lithography, Photons, Molecular interactions, Ruthenium

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Proceedings Article | 18 March 2009 Paper

Paper

Carbon contamination of extreme ultraviolet (EUV) masks and its effect on imaging

Yu-Jen Fan, Leonid Yankulin, Alin Antohe, Rashi Garg, Petros Thomas, Chimaobi Mbanaso, Andrea Wüest, Frank Goodwin, Sungmin Huh, Patrick Naulleau, Kenneth Goldberg, Iacopo Mochi, Gregory Denbeaux

Proceedings Volume 7271, 72713U (2009) https://doi.org/10.1117/12.814196

KEYWORDS: Photomasks, Contamination, Carbon, Extreme ultraviolet, Scanning electron microscopy, Printing, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Reflectivity

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Proceedings Article | 18 March 2009 Paper

Paper

RLS tradeoff vs. quantum yield of high PAG EUV resists

Craig Higgins, Alin Antohe, Greg Denbeaux, Seth Kruger, Jacque Georger, Robert Brainard

Proceedings Volume 7271, 727147 (2009) https://doi.org/10.1117/12.814307

KEYWORDS: Quantum efficiency, Extreme ultraviolet, Line edge roughness, Extreme ultraviolet lithography, Absorbance, Semiconducting wafers, Absorption, Diffusion, Photons, Photoresist materials

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Proceedings Article | 18 March 2009 Paper

Paper

EUV resist outgassing: scaling to HVM intensity

Alin Antohe, Chimaobi Mbanaso, Yu-Jen Fan, Leonid Yankulin, Rashi Garg, Petros Thomas, Gregory Denbeaux, Emil Piscani, Andrea Wuest

Proceedings Volume 7271, 727126 (2009) https://doi.org/10.1117/12.816555

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Molecules, Photoresist materials, Polymethylmethacrylate, Spectroscopy, Semiconducting wafers, Polymers, EUV optics, Photons

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Proceedings Article | 18 March 2009 Paper

Paper

Estimation of cost comparison of lithography technologies at the 22-nm half-pitch node

Andrea Wüest, Andrew Hazelton, Greg Hughes

Proceedings Volume 7271, 72710Y (2009) https://doi.org/10.1117/12.814255

KEYWORDS: Extreme ultraviolet lithography, Lithography, Photomasks, Semiconducting wafers, Etching, Reticles, Double patterning technology, Metrology, Process modeling

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Proceedings Article | 4 December 2008 Paper

Paper

Cost of ownership for future lithography technologies

Andrew Hazelton, Andrea Wüest, Greg Hughes, Lloyd Litt, Frank Goodwin

Proceedings Volume 7140, 71401Q (2008) https://doi.org/10.1117/12.804711

KEYWORDS: Extreme ultraviolet lithography, Lithography, Photomasks, Semiconducting wafers, Etching, Reticles, Metrology, Double patterning technology, Process modeling

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Proceedings Article | 19 May 2008 Paper

Paper

Mask and wafer cost of ownership (COO) from 65 to 22 nm half-pitch nodes

Greg Hughes, Lloyd Litt, Andrea Wüest, Shyam Palaiyanur

Proceedings Volume 7028, 70281P (2008) https://doi.org/10.1117/12.793067

KEYWORDS: Photomasks, Semiconducting wafers, Lithography, Extreme ultraviolet, Manufacturing, Extreme ultraviolet lithography, Optical proximity correction, Optical lithography, Wafer-level optics, Double patterning technology

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Proceedings Article | 19 May 2008 Paper

Paper

Predicting lithography costs: guidance for ≤ 32 nm patterning solutions

Andrew Hazelton, Andrea Wüest, Greg Hughes, Michael Lercel

Proceedings Volume 7028, 70283N (2008) https://doi.org/10.1117/12.793129

KEYWORDS: Lithography, Extreme ultraviolet, Photomasks, Reticles, Double patterning technology, Optical lithography, Extreme ultraviolet lithography, Etching, Semiconducting wafers, Manufacturing

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Proceedings Article | 15 April 2008 Paper

Paper

Photons, electrons, and acid yields in EUV photoresists: a progress report

Robert Brainard, Elsayed Hassanein, Juntao Li, Piyush Pathak, Brad Thiel, Franco Cerrina, Richard Moore, Miguel Rodriguez, Boris Yakshinskiy, Elena Loginova, Theodore Madey, Richard Matyi, Matt Malloy, Andrew Rudack, Patrick Naulleau, Andrea Wüest, Kim Dean

Proceedings Volume 6923, 692325 (2008) https://doi.org/10.1117/12.773869

KEYWORDS: Electrons, Photons, Quantum efficiency, Extreme ultraviolet, Polymers, Monte Carlo methods, Extreme ultraviolet lithography, Oscillators, Line width roughness, Electronics

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Proceedings Article | 1 April 2008 Paper

Paper

EUV optics contamination studies in presence of selected hydrocarbons

R. Garg, A. Wüest, E. Gullikson, S. Bajt, G. Denbeaux

Proceedings Volume 6921, 692136 (2008) https://doi.org/10.1117/12.772770

KEYWORDS: Carbon, Contamination, Reflectivity, Extreme ultraviolet lithography, Mirrors, EUV optics, Ruthenium, Extreme ultraviolet, Molecules, Xenon

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Proceedings Article | 28 March 2008 Paper

Paper

Extreme ultraviolet resist outgassing and its effect on nearby optics

Gregory Denbeaux, Rashi Garg, Chimaobi Mbanaso, Justin Waterman, Leonid Yankulin, Alin Antohe, Yu-Jen Fan, Warren Montgomery, Kim Dean, Kevin Orvek, Andrea Wüest, Yayi Wei, Frank Goodwin, Obert Wood, Chiew-Seng Koay, Eric Gullikson, Andy Aquila, Charles Tarrio, Steven Grantham, Saša Bajt

Proceedings Volume 6921, 69211G (2008) https://doi.org/10.1117/12.772670

KEYWORDS: Mirrors, Reflectivity, EUV optics, Molecules, Extreme ultraviolet lithography, Contamination, Spectroscopy, Extreme ultraviolet, Photoresist materials, Calibration

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Proceedings Article | 21 March 2008 Paper

Paper

Surface phenomena related to degradation of EUV mirrors: interaction of ethyl alcohol with ruthenium surfaces

B. Yakshinskiy, Iwao Nishiyama, Andrea Wüest, Theodore Madey

Proceedings Volume 6921, 69213E (2008) https://doi.org/10.1117/12.774012

KEYWORDS: Bioalcohols, Ruthenium, Telescopic pixel displays, Carbon, Carbon monoxide, Extreme ultraviolet lithography, Chemistry, Mirrors, Adsorption, Extreme ultraviolet

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Showing 5 of 15 publications

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