Dr. Anna Lio
Senior Principal Engineer at Intel Corp.
SPIE Involvement:
Editor | Author
Area of Expertise:
PhotoLithography , EUV Lithography , Photoresists , Material Science , Process Integration
Profile Summary

Dr. Anna Lio is a Senior Principal Engineer at Intel Corporation, Portland Technology Development. She manages the development of all EUV lithography materials for Intel’s current and next generation technologies.
Prior to that she led the development of lithography processes for Intel’s revolutionary trigate transistor process technology at the 22 nm node.
She joined Intel in 1997 and has worked in the area of photoresist, design rules definition, microprocessor process development and integration for every Intel’s technology starting at the 130nm node. She is the author of several papers and the recipient of 3 Intel Achievement Awards, Intel’s highest technical recognition.
Anna holds a M.S. in Physics from the University of Pisa (Italy) and a PhD in Electrical Engineering from the University of Glasgow (UK). During her PhD, she was a visiting scholar at the Materials Sciences Division at LBNL in Berkeley, CA – an experience that ultimately shaped her personal and professional life.
Anna is passionate about empowering women in science and engineering and is an active mentor at the corporate, college and high school level.
Outside of work Anna enjoys spending time with her two kids and go on rock climbing and mountaineering adventures.
Publications (3)

Proceedings Article | 22 February 2021 Presentation
Proceedings Volume 11609, 1160902 (2021) https://doi.org/10.1117/12.2592862

Proceedings Article | 18 March 2016 Open Access Paper
Proceedings Volume 9776, 977602 (2016) https://doi.org/10.1117/12.2225014
KEYWORDS: Extreme ultraviolet, Reticles, Pellicles, Photomasks, Semiconducting wafers, Extreme ultraviolet lithography, Scanners, Optical lithography, Inspection, Yield improvement

Proceedings Article | 18 March 2016 Paper
Proceedings Volume 9776, 97760V (2016) https://doi.org/10.1117/12.2225017
KEYWORDS: Extreme ultraviolet lithography, Photoresist materials, Extreme ultraviolet, Stochastic processes, Photoresist developing, Electrons, Absorbance, Chemistry, Optical lithography, Chemically amplified resists

Proceedings Volume Editor (4)

SPIE Conference Volume | 24 May 2023

SPIE Conference Volume | 15 June 2022

SPIE Conference Volume | 19 April 2021

SPIE Conference Volume | 13 April 2020

Conference Committee Involvement (9)
Optical and EUV Nanolithography XXXVI
27 February 2023 | San Jose, California, United States
Optical and EUV Nanolithography XXXV
25 April 2022 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography XII
22 February 2021 | Online Only, California, United States
Extreme Ultraviolet (EUV) Lithography XI
24 February 2020 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography X
25 February 2019 | San Jose, California, United States
Showing 5 of 9 Conference Committees
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top