Mr. Chang-Hwan Kim Profile

Chang-Hwan Kim

at SAMSUNG Electronics Co Ltd

SPIE Involvement:

Author

Publications (14)

Proceedings Article | 28 May 2004 Paper

Study of Cr patch validity for ArF CPL mask and its fabrication

Chang-Hwan Kim, Sung-Hyuk Kim, Myoung-Soo Lee, Ji-Soong Park, In-Gyun Shin, Sung-Woon Choi, Hee-Sun Yoon, Woo-Sung Han

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.535976

KEYWORDS: Chromium, Photomasks, Resolution enhancement technologies, Optical alignment, Laser processing, Semiconducting wafers, Phase shifts, Lithography, Logic devices, Control systems

Read Abstract +

Proceedings Article | 14 May 2004 Paper

Application of newly synthesized poly(hydroxystyrene-acrylate) copolymers to improve vacuum stability on E-beam resist for mask fabrication

Dong-hwal Lee, Sang-jung Kim, Dong-uk Choi, Deogbae Kim, Jaehyun Kim, Chang-hwan Kim

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.534999

KEYWORDS: Polymers, Mask making, Lithography, Chemistry, Line edge roughness, Photomasks, Electron beam lithography, Reticles, Polymethylmethacrylate, Extreme ultraviolet lithography

Read Abstract +

Proceedings Article | 28 August 2003 Paper

Phase defect printability analysis for chromeless phase lithography technology

Sungmin Huh, JoHyung Park, Dong-Hoon Chung, Chang-Hwan Kim, In-Kyun Shin, Sung-Woon Choi, Jung-Min Sohn

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504395

KEYWORDS: Photomasks, Inspection, Quartz, Dry etching, Finite-difference time-domain method, Lithography, Defect inspection, Semiconducting wafers, Mask making, Defect detection

Read Abstract +

Proceedings Article | 11 March 2002 Paper

Extended capability of laser writer for masks beyond 180-nm nodes

Sung-Yong Cho, Jeong-Yun Lee, Chang-Hwan Kim, Seong-Woon Choi, Woo-Sung Han, Jung-Min Sohn

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458290

KEYWORDS: Critical dimension metrology, Photomasks, Photoresist processing, Scanning electron microscopy, Scattering, Standards development, Phase shifts, Semiconducting wafers, Printing, Optics manufacturing

Read Abstract +

Proceedings Article | 11 March 2002 Paper

Analysis of dry etch loading effect in mask fabrication

Jeong-Yun Lee, Sung-Yong Cho, Chang-Hwan Kim, Sung-Woo Lee, Seong-Woon Choi, Woo-Sung Han, Jung-Min Sohn

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458341

KEYWORDS: Etching, Chromium, Critical dimension metrology, Photomasks, Oxygen, Plasma etching, Dry etching, Mask making, Plasma, Optical proximity correction

Read Abstract +

Proceedings Article | 5 September 2001 Paper

Application of chemically amplified resist to 10-keV e-beam system

Sung-Hee Ahn, Chang-Hwan Kim, Seung-Hune Yang, Seong-Yong Moon, Seong-Woon Choi, Woo-Sung Han, Jung-Min Sohn

Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438348

KEYWORDS: Chromium, Chemically amplified resists, Scattering, Fluctuations and noise, Photomasks, Mask making, Etching, Electron beam lithography, Lithography, Scanning electron microscopy

Read Abstract +

Proceedings Article | 5 September 2001 Paper

Resolution improvement of chemical-amplification resist using process-induced effect correction

Ji-Hyeon Choi, Chang-Hwan Kim, Jeong-Yun Lee, Seong-Yong Moon, Seong-Woon Choi, Woo-Sung Han, Jung-Min Sohn

Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438359

KEYWORDS: Etching, Dry etching, Critical dimension metrology, Photoresist processing, Chromium, Data modeling, Photomasks, Instrument modeling, Scattering, Diffusion

Read Abstract +

Proceedings Article | 22 August 2001 Paper

Method for prevention of unopened contact hole in dual-damascene process

Gyu-Ho Lyu, Chang-Hwan Kim, Suk-Joo Lee, Hee-Hong Yang, Dae-Yup Lee, Ji-Yong Yoo, Jeong-Woo Lee, Yoo-Hyon Kim, Jeong-Lim Nam, Woo-Sung Han

Proceedings Volume 4344, (2001) https://doi.org/10.1117/12.436747

KEYWORDS: Critical dimension metrology, Absorption, Photoresist materials, Deep ultraviolet, Photoresist processing, Resistance, Etching, Copper, Optical lithography, Reflection

Read Abstract +

Proceedings Article | 20 August 2001 Paper

Vacuum delay effect of CAR in mask fabrication

Chang-Hwan Kim, Chan-Uk Jeon, Sung-Jae Han, Won-Il Cho, Seong-Woon Choi, Woo-Sung Han, Jung-Min Sohn

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436658

KEYWORDS: Critical dimension metrology, Mask making, Photoresist processing, Photomasks, Chromium, Diffusion, Optical proximity correction, Ions, Chemistry, Projection systems

Read Abstract +

Proceedings Article | 9 April 2001 Paper

Application of e-beam chemically amplified resist to devices below 0.18-um node

Chan-Uk Jeon, Chang-Hwan Kim, Seong-Woon Choi, Woo-Sung Han, Jung-Min Sohn

Proceedings Volume 4349, (2001) https://doi.org/10.1117/12.425090

KEYWORDS: Photomasks, Photoresist processing, Mask making, Scanning electron microscopy, Optical proximity correction, Critical dimension metrology, Chemically amplified resists, Scattering, Vestigial sideband modulation, Diffusion

Read Abstract +

Proceedings Article | 22 January 2001 Paper

Experimental study on the possibility of chemically amplified resists for mask production for device generations < 180 nm

Chang-Hwan Kim, Chan-Uk Jeon, Seong-Woon Choi, Woo-Sung Han, Jung-Min Sohn

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410764

KEYWORDS: Photomasks, Critical dimension metrology, Optical proximity correction, Chemically amplified resists, Mask making, Photoresist processing, Scattering, Diffusion, Scanning electron microscopy, Contamination

Read Abstract +

Proceedings Article | 29 June 1998 Paper

Lithography of 180-nm design rule for 1-Gb DRAM

Dongseok Nam, Junghyun Lee, Chang-Hwan Kim, Seong-Woon Choi, Hoyoung Kang, Joo-Tae Moon

Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310727

KEYWORDS: Photomasks, Lithography, Critical dimension metrology, 193nm lithography, Photoresist processing, Photoresist developing, Monochromatic aberrations, Optical lithography, Control systems, Photoresist materials

Read Abstract +

Proceedings Article | 29 June 1998 Paper

NA optimization of 360-nm and 300-nm pitch devices

Hyoungjoon Kim, Sunggi Kim, Chang-Hwan Kim, Jin Hong, Junghyun Lee, Hoyoung Kang, Joo-Tae Moon

Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310798

KEYWORDS: Photomasks, Manufacturing, Diffraction, Semiconducting wafers, Light sources, Projection systems, Lithium, Lithography, Optical lithography, Resolution enhancement technologies

Read Abstract +

Proceedings Article | 14 June 1996 Paper

Design and properties of new deep-UV positive photoresist

Sang-Jun Choi, Si-Young Jung, Chang-Hwan Kim, Choon-Geun Park, Woo-Sung Han, Young-Bum Koh, Moon-Yong Lee

Proceedings Volume 2724, (1996) https://doi.org/10.1117/12.241831

KEYWORDS: Deep ultraviolet, Photoresist materials, Polymers, Excimer lasers, Lithography, Photoresist developing, Spectroscopy, Chemically amplified resists, Ultraviolet radiation, Absorption

Read Abstract +

Showing 5 of 14 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years