Chong Wang
at Beijing Superstring Academy of Memory Technology
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 10 April 2024 Poster + Paper
Proceedings Volume 12953, 1295310 (2024) https://doi.org/10.1117/12.3010071
KEYWORDS: Optical proximity correction, Manufacturing, Lithography, Image quality, Vestigial sideband modulation, Scanning electron microscopy, Critical dimension metrology, Image processing, Shape analysis, Compliance

Proceedings Article | 21 November 2023 Poster + Paper
Proceedings Volume 12751, 1275115 (2023) https://doi.org/10.1117/12.2686228
KEYWORDS: Optical proximity correction, Lithography, Photoresist processing, Reliability, Photoresist materials, Mask making, Manufacturing, Integrated circuits, Electron beams, Chip manufacturing

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