Dr. Curtis L. Rettig Profile

Dr. Curtis L. Rettig

Principal Scientist

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Publications (6)

Proceedings Article | 24 March 2006 Paper

High-power low cost drive laser for LPP source

Igor Fomenkov, Björn Hansson, Norbert Böwering, Alex Ershov, William Partlo, Vladimir Fleurov, Oleh Khodykin, Alexander Bykanov, Curtis Rettig, Jerzy Hoffman, Ernesto Vargas L., Juan Chavez, William Marx, David Brandt

Proceedings Volume 6151, 61513X (2006) https://doi.org/10.1117/12.655733

KEYWORDS: Gas lasers, Molybdenum, Carbon monoxide, Optical amplifiers, Laser applications, Neodymium lasers, Oscillators, Extreme ultraviolet, Excimer lasers, High power lasers

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We report on the approach for a high-power high-beam-quality drive laser system that is used for a laser-produced plasma (LPP) EUV source. Cymer has conducted research on a number of solutions for a multi-kW drive laser system that satisfy high volume production requirements. Types of lasers to be presented include XeF at 351 nm and CO₂ at 10.6 micron. We report on a high efficiency XeF amplifier with a 3rd harmonic Nd:YLF master oscillator operated in the 6 to 8 kHz range and a CO₂ laser system with Q-switched cavity dumped master oscillator and RF pumped fast axial flow amplifiers operated in the 10 to 100 kHz range. CO₂ laser short pulse gain and optical isolation techniques are reported. Optical performance data and design features of the drive laser system are discussed, as well as a path to achieve output power scaling to meet high volume manufacturing (HVM) requirements and beyond. Additionally, the electrical efficiency as a component of cost of operation is presented. Development of a drive laser with sufficient output power, high beam quality, and economical cost of operation is critical to the successful implementation of a laser-produced-plasma (LPP) EUV source for HVM applications. Cymer has conducted research on a number of solutions to this critical need. We report our progress on development of a high power system with two gas-discharge power amplifiers to produce high output power with high beam quality. We provide optical performance data and design features of the drive laser as well as a path to output power scaling to meet HVM requirements. Development of a drive laser for LPP EUV source is a challenging task. It requires multi-kW laser output power with short pulse duration and diffraction limited beam quality. In addition, this system needs to be very reliable and cost-efficient to satisfy industry requirements for high volume integrated circuit manufacturing. Feasibility studies of high power laser solutions that utilize proven laser technologies in high power optical gain modules and deliver required beam properties have been performed and are reported.

Proceedings Article | 23 March 2006 Paper

LPP EUV source development for HVM

Björn Hansson, Igor Fomenkov, Norbert Böwering, Alex Ershov, William Partlo, David Myers, Oleh Khodykin, Alexander Bykanov, Curtis Rettig, Jerzy Hoffman, Ernesto Vargas, Rod Simmons, Juan Chavez, William Marx, David Brandt

Proceedings Volume 6151, 61510R (2006) https://doi.org/10.1117/12.656687

KEYWORDS: Extreme ultraviolet, Tin, Plasma, Lithium, Extreme ultraviolet lithography, Mirrors, Ions, Prototyping, Reflectivity, Metrology

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Proceedings Article | 6 May 2005 Paper

Protection of collector optics in an LPP based EUV source

C. Rettig, O. Khodykin, J. Hoffman, W. Marx, N. Bowering, E. Vargas, A. Ershov, I. Fomenkov, W. Partlo

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.601517

KEYWORDS: Ions, Lithium, Mirrors, Extreme ultraviolet lithography, Reflectivity, Plasma, Extreme ultraviolet, EUV optics, Tin, Diffusion

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Proceedings Article | 6 May 2005 Paper

Radiation-hydrodynamics, spectral, and atomic physics modeling of laser-produced plasma EUVL light sources

J. MacFarlane, C. Rettig, P. Wang, I. Golovkin, P. Woodruff

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.600295

KEYWORDS: Plasma, Tin, Extreme ultraviolet lithography, Ionization, Optical simulations, Opacity, Pulsed laser operation, Electrons, Atomic, molecular, and optical physics, Ions

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Proceedings Article | 20 May 2004 Paper

Performance and scaling of a dense plasma focus light source for EUV lithography

Igor Fomenkov, Richard Ness, Ian Oliver, Stephan Melnychuk, Oleh Khodykin, Norbert Boewering, Curtis Rettig, Jerzy Hoffman

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.538690

KEYWORDS: Electrodes, Plasma, Extreme ultraviolet, Xenon, Tin, Light sources, Extreme ultraviolet lithography, Magnetism, Carbon, Contamination

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Proceedings Article | 16 June 2003 Paper

Performance and scaling of a dense plasma focus light source for EUV lithography

Igor Fomenkov, Richard Ness, Ian Oliver, Stephan Melnychuk, Oleh Khodykin, Norbert Bowering, Curtis Rettig, Jerzy Hoffman

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.505303

KEYWORDS: Extreme ultraviolet, Plasma, Electrodes, Xenon, Light sources, Extreme ultraviolet lithography, Mirrors, Zirconium, Lithography, Metrology

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Showing 5 of 6 publications

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