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Dr. Daniel Sweat
at Brewer Science Inc
SPIE Involvement:
Author
Publications (5)
Proceedings Article | 9 April 2024 Presentation + Paper
Lithography performance improvement of MOR by underlayers
Si Li, Xinlin Lu, Stephen Grannemann, Daniel Sweat, Kelsey Brakensiek, Pengtao Lu, Joyce Lowes, Vandana Krishnamurthy, Veerle Van Driessche, Douglas Guerrero
Proceedings Volume 12957, 1295715 (2024) https://doi.org/10.1117/12.3010887
KEYWORDS: Polymers, Film thickness, Lithography, Extreme ultraviolet lithography, Semiconducting wafers, Coating, Tin, Silicon, Diffusion
Proceedings Article | 9 April 2024 Poster + Paper
Understanding and improving performance of 14-nm HP EUV lithography via rational design of materials
Proceedings Volume 12957, 129571T (2024) https://doi.org/10.1117/12.3010498
KEYWORDS: Polymers, Extreme ultraviolet lithography, Line width roughness, Lithography, Adhesives, Adhesion, Extreme ultraviolet
Proceedings Article | 9 April 2024 Presentation + Paper
Functional underlayers, surface priming, and multilayer stacks to improve dose and adhesion of EUV photoresists
Proceedings Volume 12957, 1295712 (2024) https://doi.org/10.1117/12.3009801
KEYWORDS: Extreme ultraviolet lithography, Photoresist materials, Adhesion, Etching, Semiconducting wafers, Extreme ultraviolet, Silicon, Line width roughness, Chemically amplified resists, Amorphous carbon
Proceedings Article | 20 March 2018 Paper
Optimized plasma etch window of block copolymers and neutral brush layers for enhanced direct self-assembly pattern transfer into a hardmask layer
Proceedings Volume 10589, 105890S (2018) https://doi.org/10.1117/12.2297456
KEYWORDS: Etching, Carbon monoxide, Chemistry, Plasma etching, Oxygen, Plasma, Directed self assembly, Nitrogen
Proceedings Article | 27 March 2017 Presentation + Paper
High-χ block copolymers for directed self-assembly patterning without the need for topcoat or solvent annealing
Kui Xu, Mary Ann Hockey, Eric Calderas, Douglas Guerrero, Daniel Sweat, Jeffrey Fiehler, Richard Daugherty
Proceedings Volume 10146, 101460U (2017) https://doi.org/10.1117/12.2257354
KEYWORDS: Directed self assembly, Annealing, Polymers, Scanning electron microscopy, Wet etching, Glasses
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