Diana Convey
Sr Staff Res Engineer at Motorola Solutions Inc
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 25 October 2006 Paper
Diana Convey, Ngoc Le, Steven Smith, Paige Holm, Jeffrey Baker
Proceedings Volume 6378, 637815 (2006) https://doi.org/10.1117/12.684937
KEYWORDS: Etching, Fabry–Perot interferometers, Oxides, Mirrors, Reflectivity, Silicon, Dielectric filters, Optical filters, Digital filtering, Chromium

Proceedings Article | 20 May 2004 Paper
Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.536216
KEYWORDS: Etching, Polymerization, Molecules, Monte Carlo methods, Finite element methods, Lithography, Ultraviolet radiation, Molecular interactions, Scanning electron microscopy, Optical lithography

Proceedings Article | 27 December 2002 Paper
Pawitter Mangat, A. Alec Talin, Andrew Hooper, Diana Convey, Sang-In Han, James Wasson
Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.468106
KEYWORDS: Etching, Molybdenum, Surface roughness, Photomasks, Silicon, Multilayers, Extreme ultraviolet lithography, Reflectivity, Extreme ultraviolet, Annealing

Proceedings Article | 23 October 2002 Paper
Steven Smith, A. Talin, Steven Voight, Andy Hooper, Diana Convey
Proceedings Volume 4804, (2002) https://doi.org/10.1117/12.453551
KEYWORDS: Ferroelectric materials, Crystals, Silicon, Annealing, Sol-gels, Thin films, Scanning electron microscopy, Surface roughness, Refractive index, Perovskite

Proceedings Article | 11 March 2002 Paper
James Wasson, Diana Convey, Pawitter Mangat, D. Frank Bazzarre, Lubomir Parobek
Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458257
KEYWORDS: Thin films, Resistance, Chromium, Extreme ultraviolet lithography, Distortion, Spectroscopic ellipsometry, Absorption, Photomasks, X-rays, Semiconducting wafers

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