Mr. Eiji Kurose Profile

Eiji Kurose

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Publications (5)

Proceedings Article | 20 August 2004 Paper

Optimization of the chromium-shielding attenuated phase shift mask for 157-nm lithography

Eiji Kurose, Kunio Watanabe, Toshifumi Suganaga, Toshiro Itani, Kiyoshi Fujii

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557753

KEYWORDS: Photomasks, Binary data, Phase shifts, Lithography, Nanoimprint lithography, Transmittance, Optical lithography, Chromium, Scanning electron microscopy, Resolution enhancement technologies

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Proceedings Article | 28 May 2004 Paper

157-nm lithography with extremely high numerical aperture lens for 45-nm technology node

Toshifumi Suganaga, Jeung-Woo Lee, Eiji Kurose, Toshiyuki Ishimaru, Takamitsu Furukawa, Toshiro Itani, Kiyoshi Fujii, Julian Cashmore, Malcolm Gower

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.535119

KEYWORDS: Nanoimprint lithography, Line edge roughness, Lithography, Photomasks, Tolerancing, Phase shifting, Binary data, Objectives, Resolution enhancement technologies, Lithographic illumination

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Proceedings Article | 28 August 2003 Paper

Control of side-lobe intensity for attenuated phase-shifting mask in 157-nm lithography

Kunio Watanabe, Eiji Kurose, Toshifumi Suganaga, Toshiro Itani

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504283

KEYWORDS: Phase shifts, Transmittance, Lithography, Electroluminescence, Photomasks, Optical lithography, Nanoimprint lithography, Optical simulations, Image transmission, Laser irradiation

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Proceedings Article | 26 June 2003 Paper

Impact of attenuated phase-shifting mask for 157-nm lithography with high numerical aperture lens

Kunio Watanabe, Eiji Kurose, Toshifumi Suganaga, Toshiro Itani

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485318

KEYWORDS: Photomasks, Binary data, Transmittance, Phase shifts, Lithography, Image resolution, Image transmission, Electroluminescence, Resolution enhancement technologies, Optical simulations

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Proceedings Article | 26 June 2003 Paper

157-nm lithography for 65-nm node SRAM-gate

Toshifumi Suganaga, Shigeo Irie, Seiro Miyoshi, Jae-Hwan Kim, Kunio Watanabe, Eiji Kurose, Takamitsu Furukawa, Takuya Hagiwara, Toshiyuki Ishimaru, Toshiro Itani

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485376

KEYWORDS: Optical proximity correction, Lithography, Transmittance, Photoresist processing, Resolution enhancement technologies, Silicon, Reactive ion etching, Photomasks, Monochromatic aberrations, Optical simulations

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