Dr. Emilio Panarella Profile

Dr. Emilio Panarella

President at Physics Essays Publication

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Publications (15)

Proceedings Article | 4 August 2005 Paper

Single photons have not been detected: the alternative photon clump model

Emilio Panarella

Proceedings Volume 5866, (2005) https://doi.org/10.1117/12.637651

KEYWORDS: Diffraction, Photography, Photomultipliers, Interferometers, Single photon, Sensors, Photodetectors, Oscilloscopes, Optical filtering, Time correlated photon counting

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Proceedings Article | 3 November 2004 Paper

The VSX as a laboratory soft x-ray source for scientific analyses

Yuriy Antoshko, Ian Chapman, Robert Dotten, Xiaoming Guo, Robert Taylor, Meisheng Xu, Emilio Panarella

Proceedings Volume 5537, (2004) https://doi.org/10.1117/12.560476

KEYWORDS: Plasma, X-rays, X-ray sources, Synchrotrons, Copper, Prototyping, Ions, Magnetism, X-ray technology, Plasma generation

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Proceedings Article | 1 July 2002 Paper

New developments in ALFT soft x-ray point sources

Dario Cintron, Xiaoming Guo, Meisheng Xu, Rubin Ye, Yuriy Antoshko, Steve Drew, Albert Philippe, Emilio Panarella

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472354

KEYWORDS: X-rays, Plasma, X-ray sources, Capacitance, Cooling systems, Electrodes, Energy efficiency, Lithography, Synchrotrons, Diffusion

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Proceedings Article | 6 December 2001 Paper

Vacuum spark discharge soft x-ray source

Meisheng Xu, Rubin Ye, Xiaoming Guo, Yuriy Antoshko, Steve Drew, Ivan Ahtik, Jerzy Orzechowski, Emilio Panarella

Proceedings Volume 4502, (2001) https://doi.org/10.1117/12.449860

KEYWORDS: X-rays, X-ray sources, Plasmas, Electrodes, Capacitance, X-ray lithography, Lithography, Inductance, Cooling systems, Beryllium

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Proceedings Article | 20 August 2001 Paper

Vacuum spark point source for x-ray/EUV lithography

Xioming Guo, Meisheng Xu, Rubin Ye, Chaofeng Huang, Kazimierz Wirpszo, Emilio Panarella

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436649

KEYWORDS: X-rays, Lithography, X-ray sources, Plasma, X-ray lithography, Collimators, Prototyping, Extreme ultraviolet lithography, Synchrotrons, Semiconducting wafers

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Proceedings Article | 21 July 2000 Paper

Vacuum spark for soft x-rays and the spherical pinch for EUV as point sources for microlithography

Frank Wu, Wen-Chieh Tang, Kazimierz Wirpszo, Xiaoming Guo, Meisheng Xu, Oleg Semyonov, C. Huang, Lev Klibanov, Emilio Panarella

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390113

KEYWORDS: X-rays, Plasma, Spherical lenses, Capacitors, Optical lithography, Electrodes, Extreme ultraviolet, X-ray sources, Beryllium, Capacitance

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Proceedings Article | 25 June 1999 Paper

Vacuum spark and spherical pinch x-ray/EUV point sources

Frank Wu, Wen-Chieh Tang, Kazimierz Wirpszo, Emilio Panarella

Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351113

KEYWORDS: X-rays, Spherical lenses, Plasma, Optical lithography, Capacitors, Beryllium, X-ray sources, Lithography, X-ray technology, Electrodes

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Proceedings Article | 28 May 1997 Paper

Vacuum spark x-ray source for high-speed photography

Liyan Zhang, Emilio Panarella

Proceedings Volume 2869, (1997) https://doi.org/10.1117/12.273442

KEYWORDS: X-rays, X-ray sources, Capacitors, High speed photography, Electrodes, Head, Plasma, Inductance, PIN photodiodes, Hard x-rays

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Proceedings Article | 27 May 1996 Paper

Spherical pinch (soft x ray/EUV) and vacuum spark (soft x ray) for microlithography

Liyan Zhang, Emilio Panarella, Mariusz Bielawski, Haibo Chen

Proceedings Volume 2723, (1996) https://doi.org/10.1117/12.240479

KEYWORDS: X-rays, Spherical lenses, Optical lithography, Plasma, X-ray sources, Electrodes, Capacitors, Head, Laser applications, Ultraviolet radiation

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Proceedings Article | 19 May 1995 Paper

Characteristics of the x-ray/EUV emission from spherically pinched and vacuum spark sources

Liyan Zhang, Emilio Panarella, B. Hilko, Haibo Chen

Proceedings Volume 2437, (1995) https://doi.org/10.1117/12.209173

KEYWORDS: X-rays, Spherical lenses, Plasma, Electrodes, Laser applications, Optical lithography, Ultraviolet radiation, Aluminum, Laser development, Noble gases

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Proceedings Article | 12 July 1994 Paper

Radiation emission characteristics in the x-ray/EUV/FUV from spherically pinched and vacuum spark sources

Jiong Chen, Emilio Panarella, B. Hilko, Haibo Chen

Proceedings Volume 2278, (1994) https://doi.org/10.1117/12.180021

KEYWORDS: Plasma, X-rays, Spherical lenses, Optical filters, Aluminum, Ultraviolet radiation, X-ray detectors, Ultraviolet detectors, Deep ultraviolet, Electrodes

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Proceedings Article | 13 May 1994 Paper

Soft x-ray output from the spherical pinch plasma radiation source (SPX II) for microlithography applications

Jiong Chen, Emilio Panarella, B. Hilko, Haibo Chen

Proceedings Volume 2194, (1994) https://doi.org/10.1117/12.175809

KEYWORDS: X-rays, Plasma, Spherical lenses, Magnetism, Wavefronts, Optical lithography, Gases, Visible radiation, Prototyping, Argon

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Proceedings Article | 24 June 1993 Paper

Characteristics of the spherical pinch plasma radiation source (SPX II) for x-ray, UV, and deep-UV lithography

Shridar Aithal, Emilio Panarella, M. Lamari, B. Hilko, Robert McIntosh

Proceedings Volume 1924, (1993) https://doi.org/10.1117/12.146519

KEYWORDS: Plasma, X-rays, Spherical lenses, Deep ultraviolet, Ultraviolet radiation, Switches, X-ray lithography, Prototyping, Beryllium, Fusion energy

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Proceedings Article | 9 July 1992 Paper

Spherical pinch x-ray generator (SPX II): prototype performance for x-ray lithography (Poster Paper)

Shridar Aithal, Kenji Kawai, M. Lamari, Emilio Panarella

Proceedings Volume 1671, (1992) https://doi.org/10.1117/12.136028

KEYWORDS: X-rays, Plasma, Deep ultraviolet, X-ray lithography, Spherical lenses, Ultraviolet radiation, Energy efficiency, Prototyping, Lithography, Energy transfer

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Proceedings Article | 1 August 1991 Paper

Spherical pinch x-ray generator prototype for microlithography

Kenji Kawai, Emilio Panarella, D. Mostacci

Proceedings Volume 1465, (1991) https://doi.org/10.1117/12.47366

KEYWORDS: X-rays, Spherical lenses, X-ray lithography, Plasma, Prototyping, Optical lithography, X-ray sources, Lithography, Manufacturing, Ion beams

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Showing 5 of 15 publications

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