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Eric Bouche
General Manager at Veeco Instruments Inc
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Publications (3)
Proceedings Article | 28 March 2017 Presentation + Paper
Wafer-shape metrics based foundry lithography
Sungtae Kim, Frida Liang, Jeffrey Mileham, Damon Tsai, Eric Bouche, Sean Lee, Albert Huang, C. F. Hua, Ming Sheng Wei
Proceedings Volume 10145, 101450P (2017) https://doi.org/10.1117/12.2257799
KEYWORDS: Semiconducting wafers, Manufacturing, Lithography, Process control, Metrology, Overlay metrology, Interferometry, Distortion, Chemical mechanical planarization, Inspection, Data modeling, Oxides
Proceedings Article | 24 March 2016 Paper
Study of correlation between overlay and displacement measured by Coherent Gradient Sensing (CGS) interferometry
Jeffrey Mileham, Yasushi Tanaka, Doug Anberg, David Owen, Byoung-Ho Lee, Eric Bouche
Proceedings Volume 9778, 97782W (2016) https://doi.org/10.1117/12.2220531
KEYWORDS: Overlay metrology, Lithography, Process control, Interferometry, Optical lithography, Semiconductors, Distortion, High volume manufacturing, Semiconducting wafers, Data modeling, Scanners
Proceedings Article | 8 March 2016 Paper
Process tool monitoring and matching using interferometry technique
Proceedings Volume 9778, 977831 (2016) https://doi.org/10.1117/12.2220479
KEYWORDS: Interferometry, Semiconducting wafers, Process control, Semiconductors, Image processing, Control systems, Manufacturing, Defect inspection, Inspection, Overlay metrology, Scanners, Interferometers
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