Fang Yuan Xiao
at Semiconductor Manufacturing International Corp
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 21 March 2017 Paper
Fang-Yuan Xiao, Qiu-Hua Han, Hai-Yang Zhang
Proceedings Volume 10149, 101490Z (2017) https://doi.org/10.1117/12.2266539
KEYWORDS: Etching, Plasma, Plasma etching, Focus stacking software, Ions, Polymers, Critical dimension metrology, Process control

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