The Sn15Sb85 alloy is characterized by its rapid phase transition. However, its poor thermal stability hinders its application as phase change memory material. After nitrogen doping, the crystallization temperature and 10-year data retention temperature of Sn15Sb85 thin films even reach 235‡C and 173°C, respectively. Both the crystallization activation energy and the amorphous resistance of the thin films increase as well. As a result, the material thermal stability is significant improved. The surface roughness of the films is evaluated by atomic force microscope (AFM). The phase change speed of the thin films, measured by the picosecond laser technique, remains fast.
The amorphous-to-crystalline transitions of N-doped GeTe films are investigated by in situ film resistance measurements. Both the crystallization temperature and resistance of the N-doped films increase. The analysis of X-ray diffraction (XRD) measurement indicates that the grain size of the films with more nitrogen content can be refined, leading to the improvement in the resistance and thermal stability of the phase change films. The N-doped GeTe films have higher activation energy for crystallization. The 10-year lifetime is raised from 90°C of undoped GeTe film to 138°C of the N-doped GeTe film. The better surface roughness is confirmed by atomic force microscopy. The phase change speed is evaluated by the picosecond laser pump-probe technology.
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