Dr. Johannes Ruoff Profile

Dr. Johannes Ruoff

Optical Designer at Carl Zeiss SMT GmbH

SPIE Involvement:

Author

SPIE Journal Paper | 4 October 2018

Rapid evaluation of vignetting-free high-performance systems

Gregory Forbes, Johannes Ruoff

OE, Vol. 57, Issue 10, 101709, (October 2018) https://doi.org/10.1117/12.10.1117/1.OE.57.10.101709

KEYWORDS: Wavefronts, Optical design, Optical engineering, Error analysis, Zernike polynomials, Ray tracing, Statistical analysis, Vignetting, Visualization, Light emitting diodes

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Proceedings Article | 27 November 2017 Paper

Rapid evaluation of high-performance systems

G. Forbes, J. Ruoff

Proceedings Volume 10590, 1059004 (2017) https://doi.org/10.1117/12.2294613

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Proceedings Article | 27 September 2016 Paper

Validity of ray trace based performance predictions of optical systems with diffractive optical elements (DOE)

Markus Seesselberg, Bernd Kleemann, Johannes Ruoff

Proceedings Volume 9953, 995306 (2016) https://doi.org/10.1117/12.2236604

KEYWORDS: Diffractive optical elements, Ray tracing, Far-field diffraction, Diffraction gratings, Computer generated holography, Geometrical optics, Optical design software, Refraction, Far-field diffraction, Diffraction, Refractive index

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Proceedings Article | 1 April 2013 Paper

Modeling studies on alternative EUV mask concepts for higher NA

Andreas Erdmann, Tim Fühner, Peter Evanschitzky, Jens Timo Neumann, Johannes Ruoff, Paul Gräupner

Proceedings Volume 8679, 86791Q (2013) https://doi.org/10.1117/12.2011432

KEYWORDS: Photomasks, Image quality standards, Nanoimprint lithography, Lithography, Molybdenum, Binary data, Optical proximity correction, Extreme ultraviolet, Silicon, Multilayers

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Proceedings Article | 5 April 2011 Paper

AIMS EUV: the actinic aerial image review platform for EUV masks

Dirk Hellweg, Johannes Ruoff, Alois Herkommer, Joachim Stühler, Thomas Ihl, Heiko Feldmann, Michael Ringel, Ulrich Strößner, Sascha Perlitz, Wolfgang Harnisch

Proceedings Volume 7969, 79690H (2011) https://doi.org/10.1117/12.879422

KEYWORDS: Extreme ultraviolet, Scanners, Extreme ultraviolet lithography, Photomasks, EUV optics, Reticles, Projection systems, Optics manufacturing, Charge-coupled devices, Artificial intelligence

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Proceedings Article | 29 September 2010 Paper

Impact of mask topography and multilayer stack on high NA imaging of EUV masks

Johannes Ruoff

Proceedings Volume 7823, 78231N (2010) https://doi.org/10.1117/12.864120

KEYWORDS: Reflectivity, Diffraction, Photomasks, Extreme ultraviolet, Bismuth, Reticles, Critical dimension metrology, Apodization, Nickel, Refractive index

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Proceedings Article | 9 September 2010 Paper

Using orientation Zernike polynomials to predict the imaging performance of optical systems with birefringent and partly polarizing components

Johannes Ruoff, Michael Totzeck

Proceedings Volume 7652, 76521T (2010) https://doi.org/10.1117/12.871896

KEYWORDS: Polarization, Zernike polynomials, Wavefronts, Imaging systems, Wave plates, Polarizers, Apodization, Chemical elements, Optical imaging, Optical components

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Proceedings Article | 20 March 2010 Paper

Actinic review of EUV masks

Heiko Feldmann, Johannes Ruoff, Wolfgang Harnisch, Winfried Kaiser

Proceedings Volume 7636, 76361C (2010) https://doi.org/10.1117/12.848380

KEYWORDS: Extreme ultraviolet, Photomasks, Mirrors, Scanners, Extreme ultraviolet lithography, EUV optics, Metrology, Zone plates, Photons, Imaging systems

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SPIE Journal Paper | 1 July 2009

Orientation Zernike polynomials: a useful way to describe the polarization effects of optical imaging systems

Johannes Ruoff, Michael Totzeck

JM3, Vol. 8, Issue 03, 031404, (July 2009) https://doi.org/10.1117/12.10.1117/1.3173803

KEYWORDS: Zernike polynomials, Polarization, Wavefronts, Apodization, Wave plates, Resolution enhancement technologies, Polarizers, Lithography, Critical dimension metrology, Imaging systems

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Proceedings Article | 4 December 2008 Paper

Orientation Zernike Polynomials: a systematic description of polarized imaging using high NA lithography lenses

Tilmann Heil, Johannes Ruoff, Jens Timo Neumann, Michael Totzeck, Daniel Krähmer, Bernd Geh, Paul Gräupner

Proceedings Volume 7140, 714018 (2008) https://doi.org/10.1117/12.805438

KEYWORDS: Polarization, Wavefronts, Apodization, Zernike polynomials, Lithography, Critical dimension metrology, Imaging systems, Lithographic lenses, Diffraction, Process control

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Proceedings Article | 30 October 2007 Paper

Polarization-induced astigmatism caused by topographic masks

Johannes Ruoff, Jens Timo Neumann, Emil Schmitt-Weaver, Eelco van Setten, Nicolas le Masson, Chris Progler, Bernd Geh

Proceedings Volume 6730, 67301T (2007) https://doi.org/10.1117/12.747039

KEYWORDS: Diffraction, Polarization, Photomasks, Monochromatic aberrations, Binary data, Birefringence, Electromagnetism, Chromium, Commercial off the shelf technology, Reticles

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Proceedings Article | 26 March 2007 Paper

The impact of projection lens polarization properties on lithographic process at hyper-NA

Bernd Geh, Johannes Ruoff, Jörg Zimmermann, Paul Gräupner, Michael Totzeck, Markus Mengel, Uwe Hempelmann, Emil Schmitt-Weaver

Proceedings Volume 6520, 65200F (2007) https://doi.org/10.1117/12.722317

KEYWORDS: Polarization, Wave plates, Resolution enhancement technologies, Polarizers, Birefringence, Optical components, Apodization, Lithography, Matrices, Optical proximity correction

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Proceedings Article | 14 October 2005 Paper

Optical systems design with integrated rigorous vector diffraction

Bernd Kleemann, Johannes Ruoff, Markus Seeßelberg, Johannes-Maria Kaltenbach, Christoph Menke, Hans-Jürgen Dobschal

Proceedings Volume 5962, 596205 (2005) https://doi.org/10.1117/12.622247

KEYWORDS: Point spread functions, Polarization, Diffraction, Holographic optical elements, Diffractive optical elements, Diffraction gratings, Optical design, Optical components, Ray tracing, Objectives

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SPIE Journal Paper | 1 July 2005

Polarization influence on imaging

Michael Totzeck, Paul Gräupner, Tilmann Heil, Aksel Göhnermeier, Olaf Dittmann, Daniel Kraehmer, Vladimir Kamenov, Johannes Ruoff, Donis Flagello

JM3, Vol. 4, Issue 03, 031108, (July 2005) https://doi.org/10.1117/12.10.1117/1.2049187

KEYWORDS: Polarization, Diffraction, Wavefronts, Imaging systems, Zernike polynomials, Superposition, Jones vectors, Radio propagation, Birefringence, Lithography

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Proceedings Article | 12 May 2005 Paper

How to describe polarization influence on imaging

M. Totzeck, P. Graupner, T. Heil, A. Gohnermeier, O. Dittmann, D. Krahmer, V. Kamenov, J. Ruoff, D. Flagello

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.599908

KEYWORDS: Polarization, Diffraction, Wavefronts, Superposition, Imaging systems, Jones vectors, Zernike polynomials, Radio propagation, Wave propagation, Birefringence

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Showing 5 of 15 publications

Conference Committee Involvement (3)

Modeling Aspects in Optical Metrology IX

26 June 2023 | Munich, Germany

Modeling Aspects in Optical Metrology VIII

21 June 2021 | Online Only, Germany

Modeling Aspects in Optical Metrology VII

24 June 2019 | Munich, Germany

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