Dr. Kezhao Xing
Senior Specialist and Sales Representative at Mycronic AB
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 19 May 2008 Paper
Kezhao Xing, Charles Björnberg, Henrik Karlsson, Adisa Paulsson, Peter Beiming, Jukka Vedenpää, Jonathan Walford
Proceedings Volume 7028, 70281Z (2008) https://doi.org/10.1117/12.793077
KEYWORDS: Photomasks, Etching, Electron beam lithography, Lithography, Deep ultraviolet, Reflectivity, Binary data, Photoresist processing, Standards development, Manufacturing

Proceedings Article | 1 November 2007 Paper
Kezhao Xing, Charles Björnborg, Henrik Karlsson, Adisa Paulsson, Anna Rosendahl, Peter Beiming, Jukka Vedenpää, Jonathan Walford, Tom Newman
Proceedings Volume 6730, 67303Z (2007) https://doi.org/10.1117/12.746855
KEYWORDS: Photomasks, Lithography, Electron beam lithography, Deep ultraviolet, Etching, Reflectivity, Binary data, Standards development, Image resolution, Photoresist processing

Proceedings Article | 28 June 2005 Paper
Kezhao Xing, Johan Karlsson, Adisa Paulson, Charles Bjornberg, Axel Lundvall, Peter Hogfeldt, Jukka Vedenpaa, Robin Goodoree, Mans Bjuggren
Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617056
KEYWORDS: Photomasks, Diffractive optical elements, Lithography, Binary data, Deep ultraviolet, Etching, Critical dimension metrology, Standards development, Vestigial sideband modulation, Photoresist processing

Proceedings Article | 4 May 2005 Paper
Adisa Paulsson, Kezhao Xing, Hans Fosshaug, Axel Lundvall, Charles Bjoernberg, Johan Karlsson
Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599938
KEYWORDS: Photomasks, Diffusion, Lithography, Critical dimension metrology, Deep ultraviolet, Photoresist processing, Control systems, Chemically amplified resists, Temperature metrology, Manufacturing

Proceedings Article | 6 December 2004 Paper
Johan Karlsson, Kezhao Xing, Adisa Bajramovic, Henrik Dahlberg, Charles Bjornberg, Peter Hogfeldt, Lars Kjellberg, Hans Fosshaug, Anna Dahlberg, Axel Lundvall
Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569653
KEYWORDS: Etching, Dry etching, Photomasks, Diffractive optical elements, Reactive ion etching, Deep ultraviolet, Photoresist processing, Lithography, Image resolution, Manufacturing

Showing 5 of 7 publications
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