Koichiro Tsujita
General Manager at Canon Inc
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Author
Publications (39)

Proceedings Article | 9 July 2015 Paper
Proceedings Volume 9658, 96580A (2015) https://doi.org/10.1117/12.2192529
KEYWORDS: Optical lithography, Photomasks, Source mask optimization, Lithography, Etching, Scanning electron microscopy, Logic devices, Computer programming, Photovoltaics, Metals

Proceedings Article | 18 March 2015 Paper
Proceedings Volume 9426, 94261U (2015) https://doi.org/10.1117/12.2084846
KEYWORDS: Optical lithography, Logic, Double patterning technology, Etching, Optical proximity correction, Photomasks, Source mask optimization, Neodymium, Fiber optic illuminators, Picosecond phenomena

Proceedings Article | 16 September 2014 Paper
Proceedings Volume 9235, 92350C (2014) https://doi.org/10.1117/12.2069353
KEYWORDS: Optical proximity correction, Lithography, Double patterning technology, Critical dimension metrology, Manufacturing, Photomasks, Optics manufacturing, Scanning electron microscopy, Databases, Image processing

Proceedings Article | 31 March 2014 Paper
Proceedings Volume 9052, 905213 (2014) https://doi.org/10.1117/12.2046120
KEYWORDS: Field effect transistors, Optical lithography, Lithography, Manufacturing, Double patterning technology, Device simulation, Photomasks, Calibration, Image processing, Photovoltaics

Proceedings Article | 31 March 2014 Paper
Proceedings Volume 9052, 90520M (2014) https://doi.org/10.1117/12.2045667
KEYWORDS: Logic, Photomasks, Semiconducting wafers, Optical proximity correction, Source mask optimization, Fiber optic illuminators, Lithography, Double patterning technology, Etching, Convolution

Showing 5 of 39 publications
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